Influences of different structures on the characteristics of H_2O-based and O_3-based La_xAl_yO films deposited by atomic layer deposition

H2O-based and O3-based LaxAlyO nanolaminate films were deposited on Si substrates by atomic layer deposition（ALD）. Structures and performances of the films were changed by different barrier layers. The effects of different structures on the electrical characteristics and physical properties of the LaxAlyO films were studied. Chemical bonds in the LaxAlyO films grown with different structures and different oxidants were also investigated with x-ray photoelectron spectroscopy（XPS）. The preliminary testing results indicate that the LaxAlyO films with different structures and different oxidants show different characteristics, including dielectric constant, equivalent oxide thickness（EOT）, electrical properties, and stability.