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In-situ etching reaction analysis of silicon nitride in ALE by fluorine radicals
In-situ etching reaction analysis of silicon nitride in ALE by fluorine radicals
2019
Kazuya Nakane
Rene Henricus Jozef Vervuurt
Takayoshi Tsutsumi
Nobuyoshi Kobayashi
Masaru Hori
Keywords:
Radical
Silicon nitride
Fluorine
Etching
Photochemistry
Materials science
In situ
in situ etching
Correction
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