Old Web
English
Sign In
Acemap
>
Paper
>
Technical issues of etching process for Nb-junction circuit technology : Reactive ion etching (RIE) of Nb films
Technical issues of etching process for Nb-junction circuit technology : Reactive ion etching (RIE) of Nb films
2008
Masaaki Maezawa
Fuminori Hirayama
Sucheta Gorwadkar
Keywords:
Rapid single flux quantum
Etching
Josephson effect
Reactive-ion etching
Electronic engineering
Materials science
Optoelectronics
Electrical engineering
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]