Inkjet silica-based coating film forming composition, method of forming a silica-based coating film, a semiconductor device and a solar cell system

The present invention includes a silicon compound, a solvent, and containing a surface control agent, the solvent, .gamma.-butyrolactone, third second solvent and the boiling point has a boiling point of 80 to 100 ° C. is 180 to 230 ° C. by weight of solvent, and the mass ratio of the γ- butyrolactone to the total weight of the solvent is 0.2 or more, the weight ratio of the second solvent to the total mass of the solvent is 0.2 to 0.5, for inkjet It relates a silica-based coating film forming composition.