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The Effect of H2O2 and 2-MT on the Chemical Mechanical Polishing of Cobalt Adhesion Layer in Acid Slurry
The Effect of H2O2 and 2-MT on the Chemical Mechanical Polishing of Cobalt Adhesion Layer in Acid Slurry
2012
Hai-Sheng Lu
Jing-Xuan Wang
Xu Zeng
Fei Chen
Xiao-Meng Zhang
Wenjun Zhang
Xin-Ping Qu
Keywords:
Materials science
Inorganic chemistry
Adhesion
Metallurgy
Cobalt
Chemical-mechanical planarization
Slurry
Correction
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