On the structural characteristics of thermally oxidized CdO thin films

In the paper, the structural characteristics of CdO thin films (d = 340 - 400 nm) obtained by thermal oxidation of evaporated metallic Cd thin films are investigated. Cd thin films were deposited in vacuum onto unheated glass substrates at source temperature of 770 K. The as-deposited Cd thin films were heat treated in ambient conditions with different heating rates and at various temperatures ranged between 300 K and 650 K. By XRD and AFM techniques the crystalline structure and surface morphology both for the as-deposited Cd films and the thermal oxidized CdO thin films are studied. The obtained results are correlated with the oxidation process that takes place during film annealing.