Chromium film deposition stimulated by nitrogen ion implantation with energies up to 30 keV

Abstract The paper presents the results of studies on main regularities of forming a two-component Cr–N material under conditions of simultaneous chromium deposition and its bombarding with nitrogen ions of 30 keV energy. It is shown that increasing the temperature of the substrate, where the composite is deposited, results in decreasing the influence of the residual atmosphere in the vacuum chamber on the structure and component composition of the material formed. At temperatures T >200 °C the coating structure does not contain Cr 2 O 3 precipitates observed at T 2 N precipitates is dominant. The specific electrical resistance of such a material changes between 4.8 and 1.22×10 −4 Ω cm depending on the substrate temperature. When studying the peculiarities of Cr–N composite deposition onto the aluminum substrate we have found that the irradiation with nitrogen ions at increased temperatures promotes the purification of coating–substrate transition zone of oxygen and carbon.