Control of semiconductor manufacturing equipment: real-time feedback control of a reactive ion etcher
1995
This paper describes the development of real-time control technology for the improvement of manufacturing characteristics of reactive ion etchers. A general control strategy is presented. The principal ideas are to sense key plasma parameters, develop a dynamic input-output model for the subsystem connecting the equipment inputs to the key plasma variables, and design and implement a multivariable control system to control these variables. Experimental results show that this approach to closed-loop control leads to a much more stable etch rate in the presence of a variety of disturbances as compared to current industrial practice. >
Keywords:
- Electronic engineering
- Semiconductor device fabrication
- Multivariable calculus
- Input/output
- Plasma parameters
- Process control
- Real-time Control System
- Control system
- Control theory
- Instrumentation and control engineering
- Control engineering
- Engineering
- multivariable control systems
- feedback control
- Plasma stability
- Etching
- Correction
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- Cite
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