Crystallizing device, optical device for crystallizing device, crystallizing method, film transistor and display

An optical system for light emitting crystallization apparatus comprising irradiating phase shift mask (1) (2), which is an amorphous semiconductor film is irradiated with a light beam having a reverse peak intensity distribution (4) to produce a crystalline semiconductor film, reverse peak point of the intensity distribution in the phase shift portion corresponding to the phase mask (1) having the smallest light intensity. Converging / diverging element (3) disposed on the light emitting optical system (2) and the optical path between the phase-shifting mask (1) on. Converging / diverging element (3) emitting the light beam converting optical system (2) provided with a recessed upwardly from having a beam intensity distribution is irradiated to shift mask (1), wherein the phase shift portions and the light intensity as the distance from the lowest phase shifter portion of the light intensity increases.