Radio frequency microelectromechanical system

A radio-frequency microelectromechanical system (RFMEMS) is a microelectromechanical systems with electronic components comprising moving sub-millimeter-sized parts that provide radio-frequency (RF) functionality. RF functionality can be implemented using a variety of RF technologies. Besides RF MEMS technology, III-V compound semiconductor (GaAs, GaN, InP, InSb), ferrite, ferroelectric, silicon-based semiconductor (RF CMOS, SiC and SiGe), and vacuum tube technology are available to the RF designer. Each of the RF technologies offers a distinct trade-off between cost, frequency, gain, large-scale integration, lifetime, linearity, noise figure, packaging, power handling, power consumption, reliability, ruggedness, size, supply voltage, switching time and weight. A radio-frequency microelectromechanical system (RFMEMS) is a microelectromechanical systems with electronic components comprising moving sub-millimeter-sized parts that provide radio-frequency (RF) functionality. RF functionality can be implemented using a variety of RF technologies. Besides RF MEMS technology, III-V compound semiconductor (GaAs, GaN, InP, InSb), ferrite, ferroelectric, silicon-based semiconductor (RF CMOS, SiC and SiGe), and vacuum tube technology are available to the RF designer. Each of the RF technologies offers a distinct trade-off between cost, frequency, gain, large-scale integration, lifetime, linearity, noise figure, packaging, power handling, power consumption, reliability, ruggedness, size, supply voltage, switching time and weight. There are various types of RF MEMS components, such as CMOS integrable RF MEMS resonators and self-sustained oscillators with small form factor and low phase noise, RF MEMS tunable inductors, and RF MEMS switches, switched capacitors and varactors. The components discussed in this article are based on RF MEMS switches, switched capacitors and varactors. These components can be used instead of FET and HEMT switches (FET and HEMT transistors in common gate configuration), and PIN diodes. RF MEMS switches, switched capacitors and varactors are classified by actuation method (electrostatic, electrothermal, magnetostatic, piezoelectric), by axis of deflection (lateral, vertical), by circuit configuration (series, shunt), by clamp configuration (cantilever, fixed-fixed beam), or by contact interface (capacitive, ohmic). Electrostatically-actuated RF MEMS components offer low insertion loss and high isolation, linearity, power handling and Q factor, do not consume power, but require a high control voltage and hermetic single-chip packaging (thin film capping, LCP or LTCC packaging) or wafer-level packaging (anodic or glass frit wafer bonding). RF MEMS switches were pioneered by IBM Research Laboratory, San Jose, CA, Hughes Research Laboratories, Malibu, CA, Northeastern University in cooperation with Analog Devices, Boston, MA, Raytheon, Dallas, TX, and Rockwell Science, Thousand Oaks, CA. A capacitive fixed-fixed beam RF MEMS switch, as shown in Fig. 1(a), is in essence a micro-machined capacitor with a moving top electrode, which is the beam. It is generally connected in shunt with the transmission line and used in X- to W-band (77 GHz and 94 GHz) RF MEMS components. An ohmic cantilever RF MEMS switch, as shown in Fig. 1(b), is capacitive in the up-state, but makes an ohmic contact in the down-state. It is generally connected in series with the transmission line and is used in DC to the Ka-band components. From an electromechanical perspective, the components behave like a damped mass-spring system, actuated by an electrostatic force. The spring constant is a function of the dimensions of the beam, as well as the Young's modulus, the residual stress and the Poisson ratio of the beam material. The electrostatic force is a function of the capacitance and the bias voltage. Knowledge of the spring constant allows for hand calculation of the pull-in voltage, which is the bias voltage necessary to pull-in the beam, whereas knowledge of the spring constant and the mass allows for hand calculation of the switching time. From an RF perspective, the components behave like a series RLC circuit with negligible resistance and inductance. The up- and down-state capacitance are in the order of 50 fF and 1.2 pF, which are functional values for millimeter-wave circuit design. Switches typically have a capacitance ratio of 30 or higher, while switched capacitors and varactors have a capacitance ratio of about 1.2 to 10. The loaded Q factor is between 20 and 50 in the X-, Ku- and Ka-band. RF MEMS switched capacitors are capacitive fixed-fixed beam switches with a low capacitance ratio. RF MEMS varactors are capacitive fixed-fixed beam switches which are biased below pull-in voltage. Other examples of RF MEMS switches are ohmic cantilever switches, and capacitive single pole N throw (SPNT) switches based on the axial gap wobble motor. RF MEMS components are biased electrostatically using a bipolar NRZ drive voltage, as shown in Fig. 2, in order to avoid dielectric charging and to increase the lifetime of the device. Dielectric charges exert a permanent electrostatic force on the beam. The use of a bipolar NRZ drive voltage instead of a DC drive voltage avoids dielectric charging whereas the electrostatic force exerted on the beam is maintained, because the electrostatic force varies quadratically with the DC drive voltage. Electrostatic biasing implies no current flow, allowing high-resistivity bias lines to be used instead of RF chokes. RF MEMS components are fragile and require wafer level packaging or single chip packaging which allow for hermetic cavity sealing. A cavity is required to allow movement, whereas hermeticity is required to prevent cancellation of the spring force by the Van der Waals force exerted by water droplets and other contaminants on the beam. RF MEMS switches, switched capacitors and varactors can be packaged using wafer level packaging. Large monolithic RF MEMS filters, phase shifters, and tunable matching networks require single chip packaging.