V. Reboud

Research Field

Enhanced photoluminescence from metals and nanoimprinted photonic crystals

V. Reboud N. Kehagias Marinella Striccoli Tiziana Placido Annamaria Panniello

Strong enhancements in the spontaneous emission intensity of dye chromophores-loaded in a printable polymer have been achieved by coupling the dye emission to surface plasmons of metallic thin films and metallic nanoparticles. The nanocomposite materials embossed by nanoimprint lithography process show good imprint properties.

Nanoimprint lithography

Chromophore

10.1109/icton.2009.5185234

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Towards the fabrication of two-dimensional plasmonic metamaterials in the visible range by nanoimprint lithography

HAL (Le Centre pour la Communication Scientifique Directe) (2008)

V. Reboud N. Kehagias Marinella Striccoli Tiziana Placido Annamaria Panniello

Nanoimprint lithography

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Nanoimprint lithography for three-dimensional nanopatterning

HAL (Le Centre pour la Communication Scientifique Directe) (2007)

N. Kehagias V. Reboud G. Chansin M. Zelsmann Claus Jeppesen

Nanoimprint lithography

Next-generation lithography

Computational lithography

Maskless lithography

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Diffractive optical element for sensor applications, fabricated by reverse contact UV Nanoimprint Lithography

HAL (Le Centre pour la Communication Scientifique Directe) (2006)

N. Kehagias G. Chansin V. Reboud Timothy Kehoe M. Zelsmann

Nanoimprint lithography

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Three dimensional on 300mm wafer scale nano imprint lithography processes

Microelectronic Engineering (2013)

S. Landis V. Reboud T. Enot C. Vizioz

Soft Lithography

Dry etching

Plasma Etching

10.1016/j.mee.2013.03.136

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Physical properties of thin nanoimprint polymer films measured by photo-acoustic metrology

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (2009)

Timothy Kehoe J. Bryner V. Reboud J. Vollmann C. M. Sotomayor Torres

The implementation of nanoimprint lithography as a nanoscale manufacturing technique for features below 50 nm requires accurate values for the physical properties of the polymers, such as Young's modulus, used in this fabrication process. These affect the flow of polymer during imprinting, and determine the strength and stability of the polymer structures that are produced. Most physical parameter values used for nanoimprinting are taken from bulk measurements. However below 100 nm, physical properties can change significantly due to the increased importance of surface and interface effects, and the confinement of polymer molecules. It order to measure directly the physical properties of samples with very small dimensions the ultrashort laser pulse photoacoustic method has been applied to layers of poly(methyl methacrylate) of thicknesses from 586 to 11 nm, spin-coated onto silicon wafers. Acoustic speeds, calculated from time of flight and film thicknesses as measured by ellipsometry, were found to increase below approximately 80 nm, with an increase of 20% for a 13 nm sample, compared to the bulk value. This corresponds to an increase in Young's modulus of 44%. It was found that when a layer of Hexamethyldisilazane (HMDS) adhesion promoter was spin-coated onto the silicon wafer, before the polymer, there was a much smaller increase in Young's modulus, of approximately 21%, at 16 nm thickness, which indicates that the increase is due to chemical effects at the interface. The photoacoustic process is numerically modelled to ensure a full analysis of the recorded signal.

Nanoimprint lithography

Ellipsometry

10.1117/12.814162

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Spontaneous emission of nanocrystals in nanoimprinted photonic structures

HAL (Le Centre pour la Communication Scientifique Directe) (2006)

V. Reboud N. Kehagias M. Zelsmann Marinella Striccoli M. Tamborra

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Fine control of critical dimension for the fabrication of large bandgap high frequency photonic and phononic crystals