William A. Johnson

JEM Engineering (United States)

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Donald R. Wilton

University of Houston

Larry K. Warne

Sandia National Laboratories

Lorena I. Basilio

Universidad Nacional Autónoma de México

Francesca Vipiana

Polytechnic University of Turin

William L. Langston

Sandia National Laboratories

J. Rivero

Polytechnic University of Turin

R. S. Coats

Sandia National Laboratories California

Michael B. Sinclair

Sandia National Laboratories

Roy Jorgenson

Sandia National Laboratories

David R. Jackson

University of Houston

Cooperative Institutions

Sandia National Laboratories

184

Sandia National Laboratories California

171

Office of Scientific and Technical Information

National Technical Information Service

n&k Technology (United States)

Lawrence Livermore National Laboratory

Los Alamos National Laboratory

Nokia (United States)

University of Wisconsin–Madison

Stanford University

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Mixed-level simulation from a hierarchical CHDL

ACM SIGDA Newsletter (1980)

William A. Johnson Jeri Jane Crowley J. D. Ray

A system for mixed-level design simulation from a comprehensive CHDL is introduced. The CHDL supports hierarchical design descriptions at behavioral, logic and electrical levels. A design is described as a set of interconnected blocks, where each block may be described at any of the three levels. A mixed-level simulation capability is described. Designs may be simulated at any of these levels, or at a mixture of levels. Simulateneous simulation of a given block at two levels is also supported. Problems related to implementation of such a system are discussed.

10.1145/382168.382170

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Citations (7)

X-Ray Mask Distortion: Process And Pattern Dependence

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (1986)

Arnold W. Yanof Douglas J. Resnick Constance A. Jankoski William A. Johnson

X-Ray lithography is widely believed to occupy an important future lithographic niche in the vicinity of 0.5 micron and below."] It will be technically easier to achieve resolution and depth of focus with X-Ray than with optical steppers in this lithographic regime. It will be much less expensive to print large volume runners like Dynamic RAMs, microprocessors, or CODECs with X-Ray than with electron beam direct write. However, it is also recognized that distortion in the X-Ray mask membrane may be a major obstacle to the exploitation of this niche, because of the extraordinary registration requirements of submicron design rules.

Distortion (music)

10.1117/12.963676

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Citations (26)

Simulation, Fabrication and Measurement of Infrared Frequency Selective Surfaces

Integrated Photonics and Nanophotonics Research and Applications (2008)

David W. Peters Lorena I. Basilio Alvaro Augusto Cruz-Cabrera William A. Johnson J. R. Wendt

We show reflection and transmission measurements from frequency selective surfaces over a broad angular and wavelength range in the midwave infrared and compare to computational models using EIGERTM, a method-of-moments code.

Reflection

Selective surface

10.1364/ipnra.2008.iwf5

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Citations (1)

Modeling of simple antennas near to and penetrating an interface

Proceedings of the IEEE (1983)

G.J. Burke William A. Johnson E.K. Miller

Some results are presented for horizontal and vertical electric dipole antennas as they are brought close to, or penetrate, the interface between two half-spaces. The model used is an electric-field integral equation together with the Sommerfeld solution for the fields caused by the interface.

Interface (matter)

10.1109/proc.1983.12539

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Citations (15)

Efficient calculation of 1-D periodic Green's functions for leaky-wave applications

URSI International Symposium on Electromagnetic Theory (2010)

S. Paulotto Guido Valerio David R. Jackson Donald R. Wilton Paolo Baccarelli

In this paper an approach is described for the efficient computation of the mixed-potential scalar and dyadic Green's functions for a one-dimensional periodic (periodic along x direction) array of point sources embedded in a planar stratified structure. Suitable asymptotic extractions are performed on the slowly converging spectral series. The extracted terms are summed back through the Ewald method, modified and optimized to efficiently deal with all the different terms. The accelerated Green's functions allow for complex wavenumbers, and are thus suitable for application to leaky-wave antennas analysis. Suitable choices of the spectral integration paths are made in order to account for leakage effects and the proper/improper nature of the various space harmonics that form the 1-D periodic Green's function.

Wavenumber

Spectral leakage

Harmonic Analysis

Green's function

Green S

10.1109/ursi-emts.2010.5637089

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Citations (7)

Issues in the evaluation of strongly near-singular integrals involving curvilinear triangles

Francesca Vipiana Donald R. Wilton William A. Johnson

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Electromagnetic Coupling Into Two Standard Calibration Standards.

Lorena I. Basilio William L. Langston Larry K. Warne Kenneth C. Chen H.G. Hudson

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Algorithm for Constructing Contour Plots

NASA Tech Briefs (1984)

William A. Johnson F. Silva

General computer algorithm developed for construction of contour plots. algorithm accepts as input data values at set of points irregularly distributed over plane. Algorithm based on interpolation scheme: points in plane connected by straight-line segments to form set of triangles. Program written in FORTRAN IV.

Interpolation

Fortran

Line (geometry)

Contour line

Line segment

Computer program

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Defect Repair Techniques For X-Ray Masks

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (1984)

D. Atwood G. J. Fisanick William A. Johnson Antonia Wagner

Low defect density masks are necessary to obtain the high chip yields required in VLSI technology. This paper will outline the boron nitride mask fabrication process that has been developed at AT&T Bell Laboratories, and discuss the nature and distribution of normally encountered defects. The advantages and disadvantages of various repair techniques will be addressed and specific examples of repairs made on silicon integrated circuit X-ray masks will be shown.

10.1117/12.942340

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Citations (11)

Status of the PBFA-II light ion beam fusion program

J. P. Quintenz J. E. Bailey K. W. Bieg D. D. Bloomquist D. L. Cook

A summary of recent progress and the present status of the PBFA-II (Particle Beam Fusion Accelerator II) light-ion beam fusion program is given. An analytic theory of applied-B ion diodes has been developed that correctly predicts the diode operating points at peak power, and there is agreement between simulations and experiment for the ion beam transport to the diode axis. The anode plasma has been identified as an area for study to improve the ion beam focusing and diode impedance behavior further. An extensive array of ion beam diagnostics has been developed and proven to operate well in the harsh X-ray environment of PBFA II. Work on interpreting data from these diagnostics has provided insights into the physics of beam generation and transport and has stimulated advances in both analytic and calculational modeling of the processes. Three plasma opening switch configurations have been identified and tested. Efficient ion beam generation has been demonstrated, and a focal spot diameter of <5.5 mm at 3/4 energy has been achieved. The peak proton power density achieved on PBFA II has risen from approximately 0.3 TW/cm/sup 2/ to approximately 3.8 (+0.7, -0.8) TW/cm/sup 2/, and the total proton energy on a 1.0-cm radius target has increased from 30 kJ to 140 kJ.< >

Fusion power

Particle beam

10.1109/pac.1989.73240

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Citations (1)