Th. Gischkat

RhySearch (Switzerland)

Author Statistics

Papers

Citation

H-Index

i-10 index

Research Trends

Author Order

Document Type

Co-Authors

W. Wesch

Friedrich Schiller University Jena

Frank Schrempel

Friedrich Schiller University Jena

Tobias Steinbach

Johannes Gutenberg University Mainz

Markus Michler

Interstate University of Applied Sciences of Technology Buchs

Sven Schröder

Fraunhofer Institute for Applied Optics and Precision Engineering

A. Neels

Swiss Federal Laboratories for Materials Science and Technology

Marcus Trost

Fraunhofer Institute for Applied Optics and Precision Engineering

T. Strüning

Interstate University of Applied Sciences of Technology Buchs

Fabian Steger

RhySearch (Switzerland)

E.-B. Kley

Friedrich Schiller University Jena

Cooperative Institutions

Friedrich Schiller University Jena

Fraunhofer Institute for Applied Optics and Precision Engineering

Interstate University of Applied Sciences of Technology Buchs

RhySearch (Switzerland)

Albert Einstein College of Medicine

Swiss Federal Laboratories for Materials Science and Technology

TU Dresden

Ostschweizer Fachhochschule OST

Universität Ulm

Fraunhofer Society

Author Statistics

Papers

Citation

H-Index

i-10 index

Research Field

Patterning of LiNbO3 by means of ion irradiation using the electronic energy deposition and wet etching

Microelectronic Engineering (2008)

Th. Gischkat Holger Hartung Frank Schrempel E.-B. Kley Andreas Tünnermann

Deposition

10.1016/j.mee.2008.11.031

Cite

Citations (14)

Channeling irradiation of LiNbO3

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms (2008)

Frank Schrempel Tobias Steinbach Th. Gischkat W. Wesch

Rutherford backscattering spectrometry

10.1016/j.nimb.2008.03.147

Cite

Citations (5)

Ion beam enhanced etching of LiNbO3

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms (2006)

Frank Schrempel Th. Gischkat Holger Hartung E.-B. Kley W. Wesch

Rutherford backscattering spectrometry

Channelling

10.1016/j.nimb.2006.04.101

Cite

Citations (67)

Low-temperature ion beam sputtered optical coatings

Applied Optics (2023)

Th. Gischkat Daniel Schachtler Fabian Steger Z. Balogh B. Vetsch

In thin film deposition processes, the lower limit of the deposition temperature is determined by the used coating technology and the duration of the coating process and is usually higher than room temperature. Hence, the processing of thermally sensitive materials and the adjustability of thin film morphology are limited. In consequence, for factual low-temperature deposition processes, an active cooling of the substrate is required. The effect of low substrate temperature on thin film properties during ion beam sputtering was investigated. The SiO2 and Ta2O5 films grown at 0°C show a trend of lower optical losses and higher laser induced damage threshold (LIDT) compared to 100°C.

10.1364/ao.480089

Cite

Citations (0)

Ion-beam induced effects at 15K in LiNbO3

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms (2008)

Th. Gischkat Frank Schrempel W. Wesch

10.1016/j.nimb.2008.03.137

Cite

Citations (2)

Annealing behavior of lithium niobate irradiated with He-ions at 100K

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms (2009)

Th. Gischkat Frank Schrempel Thomas Höche W. Wesch

10.1016/j.nimb.2009.01.115

Cite

Citations (8)

Influence of ion energy and ion species on ion channeling inLiNbO3

Physical Review B (2008)

Tobias Steinbach Frank Schrempel Th. Gischkat W. Wesch

Ion irradiation of ${\text{LiNbO}}_{3}$ causes the formation of defects due to nuclear as well as electronic energy deposition ${ϵ}_{n}$ and ${ϵ}_{e}$, respectively. However, the defect formation is influenced by the orientation of the crystal. If the irradiation is performed along a low index crystallographic direction (on-axis) the defect distributions are strongly affected by ion channeling because the ions are prevented from close collisions with the target atoms so that the penetration range of the impinging ions is increased. In order to investigate the effect of ${ϵ}_{n}$ and ${ϵ}_{e}$ on damage formation ${\text{LiNbO}}_{3}$ crystals were irradiated on- and off-axes using ${\text{Si}}^{+}$ and ${\text{Cu}}^{+}$ ions with energies ranging from 550 keV to 2 MeV. We demonstrate for on-axis irradiation that at low ion energies where ${ϵ}_{n}$ dominates the formation of defects, the defect distribution is shifted to larger depths compared to off-axis irradiation. The investigation of the shift shows a square-root dependence on both ion energy and ion species. Furthermore, on-axis irradiation was done using high-ion energies where defects are formed in the near-surface region due to electronic energy loss. Compared to off-axis irradiation a thinner amorphous surface layer was formed as a result of the reduced electronic energy loss in the case of on-axis irradiation. For on-axis irradiation ${ϵ}_{e}$ could be estimated in two different ways considering the layer thickness and the penetration range of the incident ions.

Ion track

Crystal (programming language)

Penetration (warfare)

10.1103/physrevb.78.184106

Cite

Citations (7)

Low Temperature Ion Beam Sputtered Optical Coatings

Optical Interference Coatings Conference (OIC) 2022 (2022)

Th. Gischkat Daniel Schachtler Fabian Steger Z. Balogh Roelene Botha

The effect of low temperature ion beam sputtering on thin film properties was investigated. The SiO 2 and Ta 2 O 5 films grown at 0°C show a trend of lower optical losses and higher LIDT compared to 100°C.

10.1364/oic.2022.thc.6

Cite

Citations (0)