We investigated the effect of bow reduction of AlInGaN-based deep-ultraviolet light-emitting diode (DUV LED) wafers using internally focused laser patterning. The laser-induced stress inside of the sapphire substrate was found to increase with increasing density of laser lines and decreasing distance of the laser lines to the back surface of the sapphire substrate. By adjusting the laser process, the convex bow of DUV LED wafers could be almost completely eliminated. This bow reduction resulted in an improved uniformity of the LED forward voltage across the wafer compared to the reference wafer without laser patterning.
We daily rely upon vertical-cavity surface-emitting lasers (VCSELs) for facial recognition and data communication. These lasers are now experiencing exponential growth and serves in other applications as well such as oxygen monitoring in combustion processes and in anesthetized patients in hospitals and as a source of heating in industry in the form of a large-sized array. The large interest for this laser class is linked to its beneficial qualities such as low threshold current, circular-symmetric low-divergent output beam, high efficiency, compactness, and low fabrication cost due to on-wafer testing. Due to these advantages, there is a strong push to realize VCSELs in other wavelength regimes, beyond the commercially available infrared and red. This would open completely new markets such as flood lights, projectors, sterilization, and medical diagnosis and treatment.
This presentation will provide an overview of the state-of-the-art in the development of AlGaN-based far-UVC-LED technologies. We will explore origins for the observed decline in the external quantum efficiency (EQE) with decreasing emission wavelength and present different approaches to improve the RRE, CIE, and LEE of UV light emitters. We will also discuss design aspects for far-UVC irradiation systems and provide an outlook of future prospects of far-UVC-LED device technology as well as the potential for a wider use of far-UVC sources in applications like room air disinfection.
In this paper we report on the influence of the heterostructure design of (InAlGa)N-based UV-B LEDs grown by metalorganic vapor phase epitaxy on sapphire substrates on the degradation behavior of the device. Two types of LEDs with different heterostructure design, resulting in peak-wavelengths of about 290 nm and 310 nm, respectively, were stressed at a constant operation current of 100 mA and a heat sink temperature of 20°C. Electro-optical characterization of the LEDs over 1.000 h of operation shows two different degradation modes with respect to the change of the emission spectrum and leakage current. The first mode during the initial hours (290 nm LED: 0 h - 500 h, 310 nm LED: 0 h – 100 h) of operation is represented by a fast reduction of the quantum well (QW) luminescence, a constant or increasing parasitic luminescence between 310 nm and 450 nm and a fast increase of the reverse- and forward-bias leakage current. These changes are more pronounced (higher degradation rate) in the 290 nm LEDs and can therefore be attributed to the different heterostructure design. In contrast, the second degradation mode at longer operation times (290 nm LED: >500 h, 310 nm LED: >100 h) is marked by a slow reduction of both the QW and the parasitic luminescence, as well as a slow increase of the leakage current which are similar for both types of LEDs. Furthermore, the second mode is marked by a square-root time dependence of the QW luminescence intensity, indicating a diffusion process to be involved.
The influence of the n-AlGaN contact layer thickness and doping profile on the efficiency, operating voltage and lifetime of 310 nm LEDs has been investigated. Increasing the n-contact layer thickness reduces the operation voltage of the LEDs and increases the emission power slightly. Optimizing the n-doping profile yielded enhanced conductivity and reduced operation voltage with a simultaneous output power enhancement of the LEDs. Lifetime measurements have shown that even though the output power of the LEDs was enhanced the lifetimes were not negatively affected. Room temperature photoluminescence indicates a low concentration of point defects in the n-doping region yielding minimum AlGaN resistivity.
Recent progress in the development of AlGaN-based materials and high-efficiency ultraviolet light emitting diodes (UV-LEDs) will be reviewed. The impact of UV-LEDs on applications in environmental sensing, life sciences, and medical diagnostics will be illustrated.
The impact of the operation parameters current and temperature on the degradation of AlGaN-based 233 nm far-ultraviolet-C LEDs is investigated. The observed effects can be divided into two groups: First, a rapid reduction in the optical power to about 50%–30% of the initial value during the first ∼100 h of operation, which is accompanied by an increase in the current below the diffusion voltage from 0.3 to about 1 μA, and a reduction in the hydrogen concentration in the p-side close to the active region. The second group is represented by a gradual reduction of the optical power, which runs in parallel to the effects in the first group and dominates for operation times ≥100 h. The reduction of the optical power is due to a decrease in the slope of the optical power–current characteristic. All effects are accelerated at increased stress currents and current densities—the reduction in the optical power at low (∼20 mA) and high measuring current (∼80 mA) scales with the current to the power of three. For example, after 250 h of operation, the relative optical power at a measuring current of 20 mA has decreased to about 40% when the LED was operated at a stress current of 20 mA and to <10% for a stress current of 100 mA. Furthermore, temperature has no significant impact on the reduction of the optical power during operation, i.e., the relative optical power reduced to about 25% after 250 h both when the LEDs were operated at 20 °C and when they were operated at 75 °C.
Abstract A wide range of applications utilize ultraviolet (UV) light in the UVB (280 — 320 nm) and UVC range (< 280 nm). Among them are disinfection of water, air, and surfaces, sensing applications, plant growth lighting, and material processing. While currently some of these applications are already being accessed by using conventional mercury discharge lamps, the use of semiconductor UV‐LEDs promises to revolutionize the market by expanding the range of possible applications and making them more efficient. For this, the available range of wavelengths, the LED efficiency and their output power need to be increased. This article describes the technology of nitride‐based UV‐LEDs and their applications.
