Xiuguo Chen

Huazhong University of Science and Technology

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Shiyuan Liu

Huazhong University of Science and Technology

140

Hao Jiang

Anhui University of Science and Technology

Chuanwei Zhang

Washington University in St. Louis

Honggang Gu

Huazhong University of Science and Technology

Yuki Shimizu

Tokushima University

Yating Shi

Xiamen University

Jinlong Zhu

Huazhong University of Science and Technology

Wei Gao

Xinjiang University

Chao Chen

Huazhong University of Science and Technology

Baokun Song

University of Pennsylvania

Cooperative Institutions

Huazhong University of Science and Technology

110

Innovation Team (China)

Chinese Academy of Sciences

Wuhan National Laboratory for Optoelectronics

Tohoku University

University of Chinese Academy of Sciences

Tianjin University

Tsinghua University

Zhejiang University

Harbin Institute of Technology

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Layer-dependent dielectric and optical properties of centimeter-scale 2D WSe₂: evolution from a single layer to few layers

Nanoscale (2019)

Honggang Gu Baokun Song Mingsheng Fang Yilun Hong Xiuguo Chen

The excitonic effect and JDOS dominated evolution in layer-dependent dielectric and optical properties of 2D WSe₂ were investigated by spectroscopic ellipsometry.

Ellipsometry

10.1039/c9nr04270a

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Citations (68)

An ultra-sensitive optical angle sensor for pitch deviation measurement of diffraction gratings

2018 IEEE International Conference on Advanced Manufacturing (ICAM) (2018)

Lue Quan Hiraku Matsukuma Xiuguo Chen Yuki Shimizu Wei Gao

A new method using an ultra-sensitive angle sensor to evaluate the grating pitch deviation is proposed in this paper. The principle and theoretical calculation are done to confirm the theoretical feasibility of the new proposed method. Theoretically, with a high resolution optical angle sensor, this method can reach an extremely high resolution of picometers for the evaluation of grating pitch deviation. Compensation methods of angle error during scanning process are also discussed.

Viewing angle

Pitch angle

10.1109/amcon.2018.8614962

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Citations (1)

Robust overlay metrology with differential Mueller matrix calculus

Optics Express (2017)

Xiuguo Chen Honggang Gu Hao Jiang Chuanwei Zhang Shiyuan Liu

Overlay control is of vital importance to good device performances in semiconductor manufacturing. In this work, the differential Mueller matrix calculus is introduced to investigate the Mueller matrices of double-patterned gratings with overlay displacements, which helps to reveal six elementary optical properties hidden in the Mueller matrices. We find and demonstrate that, among these six elementary optical properties, the linear birefringence and dichroism, LB' and LD', along the ± 45° axes show a linear response to the overlay displacement and are zero when the overlay displacement is absent at any conical mounting. Although the elements from the two 2 × 2 off-diagonal blocks of the Mueller matrix have a similar property to LB' and LD', as reported in the literature, we demonstrate that it is only valid at a special conical mounting with the plane of incidence parallel to grating lines. The better property of LB' and LD' than the Mueller matrix elements of the off-diagonal blocks in the presence of overlay displacement verifies them to be a more robust indicator for the diffraction-based overlay metrology.

Mueller calculus

Matrix (chemical analysis)

10.1364/oe.25.008491

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Citations (8)

Virtual X-ray critical dimension metrology via Monte Carlo simulation

Optics Letters (2024)

Jiahao Zhang Zhangyong Liu Wei Zhou Dingxuan Deng Xiuguo Chen

X-ray critical dimension (XCD) metrology is a highly promising technique for achieving sub-nanometer precision in critical dimension measurements at advanced nodes of integrated circuit manufacturing. Compared to XCD experiments utilizing synchrotron radiation sources, those employing compact X-ray sources encounter challenges like extended testing time and increased uncertainty. To evaluate the influence of experimental conditions on measurement results, we developed an ab initio virtual X-ray critical dimension metrology via a Monte Carlo simulation (MC-VXCD). Through calibrating the system parameters of the MC-VXCD to a home-built compact XCD instrument, we achieved excellent consistency between virtual and actual measurement results. The virtual instrument effectively estimated measurement errors stemming from the reduced exposure time, which significantly influences the measurement accuracy and throughput. Furthermore, through the MC-VXCD, we establish the connection between the application scenarios of the XCD metrology and the geometry of XCD instruments, offering a versatile platform for the system design, experimental configuration optimization, data analysis, etc., in XCD metrology.

Critical dimension

10.1364/ol.536611

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Citations (0)

Optimizing measurement configuration for x-ray critical dimension metrology based on condition number

Tianjuan Yang Xiuguo Chen Jiahao Zhang Shuo Liu Shiyuan Liu

In X-ray critical dimension metrology (XCD), it is a common practice to select an appropriate measurement configuration, including incidence angle, azimuth angle, exposure time, etc., to improve measurement results. This is crucial as the quality of the obtained signature is impacted not just by the instrument's precision, but also by the specific chosen measurement configuration. This is known as the measurement configuration optimization (MCO) problem. This paper proposes a general MCO method based on the theory of error propagation and error estimation techniques using condition numbers. Finally, the MCO problem in XCD is framed as optimizing the "max-min" condition number of the coefficient matrix within the context of linear error estimation. The proposed method is showcased on "virtual experiments" conducted via simulations to determine the optimal combinations of rotation angles along two coordinate axes. The method's feasibility is substantiated through a comparison with the distributions of parameter uncertainty. The results suggest that the proposed method holds promise as an alternative approach for comprehensive evaluation in the context of the MCO problem in XCD and various measurement scenarios.

Critical dimension

Propagation of uncertainty

10.1117/12.3008281

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Citations (1)

Depolarization artifacts in dual rotating-compensator Mueller matrix ellipsometry

Journal of Optics (2016)

Weiqi Li Chuanwei Zhang Hao Jiang Xiuguo Chen Shiyuan Liu

Noticeable depolarization effects are observed in the measurement of the air using an in-house developed dual rotating-compensator Mueller matrix ellipsometer. We demonstrate that these depolarization effects are essentially artifacts and mainly induced when the compensator with wavelength-dependent optical properties is integrated with the finite bandwidth detector. We define a general formula to represent the actual Mueller matrix of the compensator by taking into account the depolarization artifacts. After incorporating this formula into the system model, a correction method is further proposed, and consequently, improved accuracy can be achieved in the Mueller matrix measurement.

Mueller calculus

Ellipsometry

Matrix (chemical analysis)

Matrix method

10.1088/2040-8978/18/5/055701

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Citations (24)

Eigenvalue calibration method for dual rotating-compensator Mueller matrix polarimetry

Optics Letters (2021)

Sheng Sheng Xiuguo Chen Chao Chen Jinfeng Zhuang Cai Wang

Dual rotating-compensator Mueller matrix polarimetry (DRC-MMP) has achieved wide spread applications in material characterization, nano-scale measurement, and biomedical diagnostics. However, the traditional calibration method for DRC-MMP relies on establishing an accurate system model, making its implementation cumbersome, especially in the presence of polarizing components that are to complex to be modeled. We propose a novel, to the best of our knowledge, eigenvalue calibration method for DRC-MMP without system modeling. Two specific basis vectors are introduced in order to transform the continuously modulated light intensity in DRC-MMP into a 5 × 5 projection matrix. Eigenvalue analysis is then performed based on the light intensity projection matrix to obtain the modulation matrix and the analysis matrix associated with the polarization state generator and the polarization state analyzer, respectively. The method is applied for DRC-MMP in both single-pass and double-pass setups. The experimental results have verified the proposed calibration method.

Mueller calculus

Matrix method

Matrix (chemical analysis)

10.1364/ol.437542

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Citations (15)

Nondestructive analysis of lithographic patterns with natural line edge roughness from Mueller matrix ellipsometric data

Applied Surface Science (2015)

Xiuguo Chen Yating Shi Hao Jiang Chuanwei Zhang Shiyuan Liu

Ellipsometry

Mueller calculus

Line (geometry)

Matrix (chemical analysis)

10.1016/j.apsusc.2015.10.167

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Citations (14)

Improved nanostructure reconstruction by performing data refinement in optical scatterometry

Journal of Optics (2015)

Jinlong Zhu Hao Jiang Yating Shi Xiuguo Chen Chuanwei Zhang

Recently, we have indirectly demonstrated that nanostructure reconstruction accuracy is degraded by the outliers in optical scatterometry, and we have applied the robust estimation method to suppress these outliers. However, the existence of a possible heavy masking effect could result in the risk of low measurement accuracy, since the detection of outliers is simply based on the judgment of residual value. In this work, a novel method is introduced to directly detect outliers, which can provide the intuitional display of outliers in a two-dimensional coordinate system. Moreover, a robust correction step based on the principle of least trimmed squared estimator regression is proposed to replace the conventional Gauss–Newton iteration step, by which the more reliable and accurate nanostructure reconstruction is achieved. The improved reconstruction of a one-dimensional etched Si grating has demonstrated the feasibility of the proposed methods.

RANSAC

10.1088/2040-8978/18/1/015605

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Citations (5)

Temperature dependence of femtosecond photoacoustic process in high-precision characterization for metal nanofilms

Photoacoustics (2024)

Zhongyu Wang Min Jing Yong Sun Xuesong Wang Xiuguo Chen

Femtosecond photoacoustic detection is a powerful all-optical technique for characterizing metal nanofilms. However, the lack of accurate descriptions of the temperature-dependent optical properties of metal nanofilms during ultrafast thermal processes hinders the deep understanding of this dynamic behavior, leading to compromised measurement accuracy. To address this, we developed Critical Point Models (CPMs) for copper and AlCu nanofilms to describe their dynamic optical properties during photoacoustic testing. By integrating dynamic behavior into ultrafast laser-matter interaction and acousto-optic processes, we explored the temperature effects throughout testing. Numerical simulations were performed to analyze the temperature, stress, and surface reflectivity distributions of the nanofilms. Compared to experimental results, our dynamic models significantly improved prediction accuracy for both copper and AlCu nanofilms. This highlights the importance of temperature dependence in femtosecond photoacoustic testing and validates our model's capability to capture the behavior of metal nanofilms under ultrafast laser irradiation.

Characterization

10.1016/j.pacs.2024.100678

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Citations (0)