M. Zelsmann

Nanoimprint lithography (NIL), with its apparent simplicity and resolution down to 6 nm, has become an attractive flexible and low-cost technique for nanopatterning of thin films, which themselves act as a mask for further nanofabrication steps, or which can be used as-printed thanks to the functionality of the thin film itself. In this work, we focus on the latter approach and report on our experiments carried out to fabricate organic photonic devices. Silicon stamps, with figures down to 100 nm, are fabricated using electron beam lithography and reactive ion etching. Different fabricated stamps include waveguides, gratings, splitters and interferometers. New fabrication techniques are investigated, namely the combination of NIL with optical lithography and reverse NIL. These two techniques allow producing three-dimensional structures. For the combination of NIL with optical lithography, an original approach is used consisting of a polymer stamp on top of a quartz + metal optical mask. In the case of reverse imprint and multilevel structures, particular attention is paid to adhesion between the stamp, the polymer and the substrate on which the layer is reported. These two techniques are very promising for the fabrication of complex polymer optical devices, like distributed feedback structures, in one step.

Nanoimprint lithography

Next-generation lithography

Stencil lithography

10.1117/12.605118

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Citations (3)

Microcavités résonantes sur guide d’onde pour le piégeage de microorganismes

Simon Glicenstein Ermira Tartari Nicoletta Villa E. Picard P. Marcoux

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Self-assembly silicon nanowire growth in perfect nanoporous alumina arrays obtained by nanoimprinting

HAL (Le Centre pour la Communication Scientifique Directe) (2012)

T. Gorisse L. Dupré M. Zelsmann B. Buttard P. Gentile

Nanoporous

Silicon nanowires

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Materials and Processes in UV‐Assisted Nanoimprint Lithography

M. Zelsmann J. Boussey

This chapter contains sections titled: Introduction UV-Assisted Nanoimprint Lithography Imprinting Materials Mold Fabrication and Anti-Sticking Strategies Conclusion References

Nanoimprint lithography

Extreme Ultraviolet Lithography

10.1002/9783527633449.ch1

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Broadband optical characterization and modeling of photonic crystal waveguides for silicon optical interconnects

Journal of Applied Physics (2004)

M. Zelsmann Emmanuelle Picard T. Charvolin E. Hadji M. Heitzmann

Optical properties of a straight 50-row-long photonic crystal waveguide (PCW) are reported. This waveguide is obtained by removing one row of air holes in a triangular lattice two-dimensional photonic crystal etched on a silicon-on-insulator substrate. Transmission measurements are performed on a wide wavelength range (1.15–1.75 μm) with an external white light source. It is found that the experimental data are in very good agreement with both the theoretical transmission calculated by a two-dimensional finite difference time domain method and the theoretical photonic band structure. We show a coupling factor higher than 60% between a monomode ridge waveguide and the PCW.

Waveguide

Yablonovite

10.1063/1.1630365

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Citations (19)

Directed self-Assembled Porous Anodic Alumina as template for the CVD Growth of Silicon Nanowires

HAL (Le Centre pour la Communication Scientifique Directe) (2013)

Thérèse Gorisse Ludovic Dupré D. Buttard M. Zelsmann P. Gentile

Porous Silicon

Silicon nanowires

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