Lorri StCaire

Lawrence Berkeley National Laboratory

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Scott Dhuey

Lawrence Berkeley National Laboratory

Haoren Lu

Nexant (United States)

Deirdre L. Olynick

Lawrence Berkeley National Laboratory

J. Alexander Liddle

National Institute of Standards and Technology

Weilun L Chao

Mark Lewis

United States Naval Research Laboratory

Weilun Chao

Lawrence Berkeley National Laboratory

J Alexander Liddle

Mark D. Lewis

Lawrence Berkeley National Laboratory

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Lawrence Berkeley National Laboratory

University of California, Berkeley

Molecular Foundry

Berkeley College

National Institute of Standards and Technology

Physical Measurement Laboratory

Center for Nanoscale Science and Technology

National Institute of Standards

Communications Technology Laboratory

Albany State University

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The link between a negative high resolution resist contrast/developer performance and the Flory-Huggins parameter estimated from the Hansen solubility sphere

Lawrence Berkeley National Laboratory (2008)

Lorri StCaire Deirdre L. Olynick Weilun Chao Mark D. Lewis Haoren Lu

We have implemented a technique to identify candidate polymer solvents for spinning, developing, and rinsing for a high resolution, negative electron beam resist hexa-methyl acetoxy calix(6)arene to elicit the optimum pattern development performance. Using the three dimensional Hansen solubility parameters for over 40 solvents, we have constructed a Hansen solubility sphere. From this sphere, we have estimated the Flory Huggins interaction parameter for solvents with hexa-methyl acetoxy calix(6)arene and found a correlation between resist development contrast and the Flory-Huggins parameter. This provides new insights into the development behavior of resist materials which are necessary for obtaining the ultimate lithographic resolution.

Hildebrand solubility parameter

Flory–Huggins solution theory

HEXA

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The link between a negative high resolution resist contrast/developer performance and the Flory-Huggins parameter estimated from the Hansen solubility sphere

OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information) (2008)

Lorri StCaire Deirdre L. Olynick Weilun L Chao Mark Lewis Haoren Lu

Hildebrand solubility parameter

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