Baptiste Delatte

Université Paris-Saclay

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Luc Maurice

Institut de Recherche sur les Lois Fondamentales de l'Univers

Thomas Proslier

CEA Paris-Saclay

Diana Dragoé

Institut de Chimie Moléculaire et des Matériaux d'Orsay

Matthieu Baudrier

Commissariat à l'Énergie Atomique et aux Énergies Alternatives

FÉ

Fabien Éozénou

Institut de Recherche sur les Lois Fondamentales de l'Univers

F. Miserque

Commissariat à l'Énergie Atomique et aux Énergies Alternatives

Yasmine Kalboussi

Hôpital Saint-Antoine

Quentin Bertrand

Université Jean Monnet

Patrick Sahuquet

CEA Paris-Saclay

David Longuevergne

Laboratoire de Physique des 2 Infinis Irène Joliot-Curie

Cooperative Institutions

Université Paris-Saclay

Centre National de la Recherche Scientifique

Commissariat à l'Énergie Atomique et aux Énergies Alternatives

CEA Paris-Saclay

Institut de Recherche sur les Lois Fondamentales de l'Univers

Université Paris-Sud

Laboratoire de Physique des 2 Infinis Irène Joliot-Curie

Institut National de Physique Nucléaire et de Physique des Particules

Office National d'Études et de Recherches Aérospatiales

Laboratoire de physique des Solides

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Surface Engineering by ALD for Superconducting RF Cavities

Yasmine Kalboussi C. Antoine Md Asaduzzaman Matthieu Baudrier Quentin Bertrand

10.18429/jacow-srf2023-weiba01

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Multipacting mitigation by atomic layer deposition: the case study of Titanium Nitride

arXiv (Cornell University) (2024)

Yasmine Kalboussi S. Dadouch Baptiste Delatte Frédéric Miserques Diana Dragoé

This study investigates the use of Atomic Layer deposition (ALD) to mitigate multipacting phenomena inside superconducting radio frequency (SRF) cavities used in particle accelerators. The unique ALD capability to control the film thickness down to the atomic level on arbitrary complex shape objects enable the fine tuning of TiN film resistivity and total electron emission yield (TEEY) from coupons to devices. This level of control allows us to adequately choose a TiN film thickness that provide both a high resistivity to prevent Ohmic losses and low TEEY to mitigate multipacting for the application of interest. The methodology presented in this work can be scaled to other domain and devices subject to RF fields in vacuum and sensitive to multipacting or electron discharge processes with their own requirements in resistivities and TEEY values

Deposition

10.48550/arxiv.2405.18949

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Reducing two-level systems dissipations in 3D superconducting niobium resonators by atomic layer deposition and high temperature heat treatment

Applied Physics Letters (2024)

Y. Kalboussi Baptiste Delatte Sarra Bira Kassiogé Dembélé Xiaoyan Li

Superconducting qubits have arisen as a leading technology platform for quantum computing, which is on the verge of revolutionizing the world's calculation capacities. Nonetheless, the fabrication of computationally reliable qubit circuits requires increasing the quantum coherence lifetimes, which are predominantly limited by the dissipations of two-level system defects present in the thin superconducting film and the adjacent dielectric regions. In this paper, we demonstrate the reduction of two-level system losses in three-dimensional superconducting radio frequency niobium resonators by atomic layer deposition of a 10 nm aluminum oxide Al2O3 thin films, followed by a high vacuum heat treatment at 650 °C for few hours. By probing the effect of several heat treatments on Al2O3-coated niobium samples by x-ray photoelectron spectroscopy plus scanning and conventional high resolution transmission electron microscopy coupled with electron energy loss spectroscopy and energy dispersive spectroscopy, we witness a dissolution of niobium native oxides and the modification of the Al2O3-Nb interface, which correlates with the enhancement of the quality factor at low fields of two 1.3 GHz niobium cavities coated with 10 nm of Al2O3.

10.1063/5.0202214

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Multipacting mitigation by atomic layer deposition: The case study of titanium nitride

Journal of Applied Physics (2024)

Y. Kalboussi S. Dadouch Baptiste Delatte F. Miserque Diana Dragoé

This study investigates the use of atomic layer deposition (ALD) to mitigate multipacting phenomena inside superconducting radio frequency cavities used in particle accelerators while preserving high quality factors in the 1010 range. The unique ALD capability to control the film thickness down to the atomic level on arbitrary complex shape objects enables the fine-tuning of TiN film resistivity and total electron emission yield (TEEY) from coupons to devices. This level of control allows us to adequately choose a TiN film thickness that provides both high resistivity to prevent Ohmic losses and a low TEEY to mitigate multipacting for the application of interest. The methodology presented in this work can be scaled to other domains and devices subject to RF fields in vacuum and sensitive to multipacting or electron discharge processes with their own requirements in resistivities and TEEY values.

Ohmic contact

Deposition

Secondary emission

10.1063/5.0221943

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Reducing two-level system dissipations in 3D superconducting Niobium resonators by atomic layer deposition and high temperature heat treatment

arXiv (Cornell University) (2024)

Yasmine Kalboussi Baptiste Delatte Sarra Bira Kassiogé Dembélé Xiaoyan Li

Superconducting qubits have arisen as a leading technology platform for quantum computing which is on the verge of revolutionizing the world's calculation capacities. Nonetheless, the fabrication of computationally reliable qubit circuits requires increasing the quantum coherence lifetimes, which are predominantly limited by the dissipations of two-level system (TLS) defects present in the thin superconducting film and the adjacent dielectric regions. In this paper, we demonstrate the reduction of two-level system losses in three-dimensional superconducting radio frequency (SRF) niobium resonators by atomic layer deposition (ALD) of a 10 nm aluminum oxide Al2O3 thin films followed by a high vacuum (HV) heat treatment at 650 {\deg}C for few hours. By probing the effect of several heat treatments on Al2O3-coated niobium samples by X-ray photoelectron spectroscopy (XPS) plus scanning and conventional high resolution transmission electron microscopy (STEM/HRTEM) coupled with electron energy loss spectroscopy (EELS) and (EDX) , we witness a dissolution of niobium native oxides and the modification of the Al2O3-Nb interface, which correlates with the enhancement of the quality factor at low fields of two 1.3 GHz niobium cavities coated with 10 nm of Al2O3.

10.48550/arxiv.2402.04137

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