Christophe Péroz

Dexerials (Japan)

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Stefano Cabrini

Lawrence Berkeley National Laboratory

S. Babin

Moscow Aviation Institute

Scott Dhuey

Lawrence Berkeley National Laboratory

V. V. Yan'kov

Federal Reserve Bank of Richmond

A. Goltsov

Belgorod State Technological University

Scott Dhuey

Lawrence Berkeley National Laboratory

Giuseppe C. Calafiore

Polytechnic University of Turin

Igor Ivonin

Abeam Technologies (United States)

Alexander Koshelev

Abeam Technologies (United States)

Catherine Villard

Centre National de la Recherche Scientifique

Cooperative Institutions

Lawrence Berkeley National Laboratory

Centre National de la Recherche Scientifique

University of California, Berkeley

Sorbonne Université

Molecular Foundry

Abeam Technologies (United States)

Magic Leap (United States)

Université Grenoble Alpes

Saint-Gobain (France)

Surface du Verre et Interfaces

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Automatic measurement of electron beam size by beam metrology technique using 20nm test pattern

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena (2009)

Christophe Péroz S. Babin M. Machin Eric H. Anderson Stefano Cabrini

A robust operator independent measurement of electron beam sizes in two coordinates is demonstrated by using beam metrology (BEAMETR) technique. This method involves software associated with a specially designed pattern sample. The fabrication of this sample was done using 100keV electron beam lithography and lift-off of metal. A proximity correction was applied to improve pattern quality. The minimum feature size of the fabricated BEAMETR patterns was 20nm; this allowed for the measuring of beam size down to 2nm. Beam size and shape measurements were done using three scanning electron microscopes; their operating conditions (voltage, aperture, and astigmatism) were varied. Repeatability and test pattern dependence were also studied, which demonstrated a good consistency of the results.

Repeatability

Digital pattern generator

Maskless lithography

10.1116/1.3258652

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Citations (5)

Fabrication of 20 nm patterns for automatic measurement of electron beam size using BEAMETR technique

Microelectronic Engineering (2008)

S. Babin Stefano Cabrini Scott Dhuey B. Harteneck M. Machin

Laser linewidth

Maskless lithography

Digital pattern generator

Aperture (computer memory)

10.1016/j.mee.2008.11.074

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Citations (9)

High-Resolution, Low-Cost Spectrometer-on-Chip

Christophe Péroz S. Babin Stefano Cabrini V. V. Yan'kov Giuseppe C. Calafiore

Abstract : A novel class of low-cost and high resolution spectrometer-on-chips has been developed that are suitable for numerous laser-monitoring applications. The technology is based on the integration of digital planar holograms and a full optical circuitry on the same photonic chip. The prototypes are fabricated at a low-cost by nanoimprint lithography and are packed into the size of a USB key. Nano-spectrometers with a resolution down to 0.5 nm and a spectral range up to 229 nm were successfully demonstrated. The original concept of an on-chip spectrometer integrated into commercial image sensors was demonstrated and opens the route to numerous applications. Our miniaturized spectrometers are defining the state-of-the-art for on-chip spectroscopy, as well as in terms of spectral resolution and bandwidth than for their miniaturized size.

10.21236/ad1003432

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Step-and-repeat nanoimprint on pre-spin coated film for the fabrication of integrated optical devices

Journal of Micro/Nanolithography MEMS and MOEMS (2015)

Giuseppe C. Calafiore Alexander Koshelev Scott Dhuey Simone Sassolini Martin Messerschmidt

A step-and-repeat nanoimprint lithography (SR-NIL) process on a pre-spin-coated film is employed for the fabrication of an integrated optical device for on-chip spectroscopy. The complex device geometry has a footprint of about 3 cm2 and comprises several integrated optical components with different pattern size and density. Here, a new resist formulation for SR-NIL was tested for the first time and proved effective at dramatically reducing the occurrence of systematic defects due to film dewetting, trapped bubbles, and resist peel-off. A batch of 180 dies were imprinted, and statistics on the imprint success rate is discussed. Devices were optically characterized and benchmarked to an identical chip that was fabricated by electron-beam lithography. The overall performance of the imprinted nanospectrometers is well-aligned with that of the reference chip, which demonstrates the great potential of our SR-NIL for the low-cost manufacturing of integrated optical devices.

Nanoimprint lithography

Dewetting

Next-generation lithography

10.1117/1.jmm.14.3.033506

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Citations (9)

Combination of a spectrometer-on-chip and an array of Young’s interferometers for laser spectrum monitoring

Optics Letters (2014)

Alexander Koshelev Giuseppe C. Calafiore Christophe Péroz Scott Dhuey Stefano Cabrini

This Letter presents the design and experimental results for an on-chip photonic device for laser spectrum monitoring that combines a nanospectrometer and an array of Young's interferometers. The array of Young's interferometers and the spectrometer measure the width and wavelength of a spectrum in visible light, respectively. The accuracy of spectral width measurements is around 10% for FWHM higher than 2.5 pm. The spectrometer-on-chip is based on a digital planar hologram, and provides a resolution around 145 pm within the spectral range of 719-861 nm (142 nm bandwidth). The performance of the device is demonstrated for distinguishing between the single- and two-longitudinal mode operation of a fiber Bragg grating laser diode with 23 pm mode separation.

Spectral resolution

Free spectral range

Fiber Bragg Grating

10.1364/ol.39.005645

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Citations (12)

High critical current densities observed in PrBa2Cu3O7-x/YBa2Cu3O7-x/PrBa2Cu3O7-x ultrathin film constrictions

HAL (Le Centre pour la Communication Scientifique Directe) (2006)

Christophe Péroz J.C. Villégier Annick Dégardin Bruno Guillet Alain Kreisler

Source

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Multiband wavelength demultiplexer based on digital planar holography for on-chip spectroscopy applications

Optics Letters (2012)

Christophe Péroz Cosimo Calò A. Goltsov Scott Dhuey Alexander Koshelev

A novel type of multiband wavelength demultiplexer for on-chip spectroscopy applications is proposed, and first results of the device fabrication and characterization are reported. The devices are based on computer-designed digital planar holograms, which involve millions of lines specifically located and oriented in order to direct output light into designed focal channels according to the wavelength. Devices operate in four individual bandwidths within the visible range (477.2-478.0 nm, 528.8-529.9 nm, 586.4-587.7 nm, 628.9-630.4 nm) with 96 channels and spectral channel spacing down to 0.0375 nm/channel.

Digital holography

Demultiplexer

10.1364/ol.37.000695

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Citations (29)

Step and repeat UV nanoimprint lithography on pre-spin coated resist film: a promising route for fabricating nanodevices

Nanotechnology (2010)

Christophe Péroz Scott Dhuey M. Volger Y. Wu Deidre Olynick

A step and repeat UV nanoimprint lithography process on pre-spin coated resist film is demonstrated for patterning a large area with features sizes down to sub-15 nm. The high fidelity between the template and imprinted structures is verified with a difference in their line edge roughness of less than 0.5 nm (3σ deviation value). The imprinted pattern's residual layer is well controlled to allow direct pattern transfer from the resist into functional materials with very high resolution. The process is suitable for fabricating numerous nanodevices.

Nanoimprint lithography

Extreme Ultraviolet Lithography

10.1088/0957-4484/21/44/445301

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Citations (47)

High-Resolution Spectrometer-on-Chip Based on Digital Planar Holography

IEEE photonics journal (2011)

Christophe Péroz A. Goltsov Scott Dhuey P. V. Sasorov B. Harteneck

Digital planar holography enables the creation of a new generation of integrated photonic circuits with desired transfer function. We give here, for the first time, the basis for designing computer-generated planar holograms and demonstrate their application for spectroscopy-on-chip. Nanospectrometer chips are demonstrated with unmatched spectral resolution of up to 2 ·10 ⁵ . A specific configuration is demonstrated for easy integration of planar holograms into the full spectrometer system. The ultraminiaturization and very high performances of the devices are a breakthrough in spectroscopy and open a novel route for the digital processing of light.

Digital holography

Spectral resolution

10.1109/jphot.2011.2168950

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Citations (16)

Multilayer lift-off process for sub-15-nm patterning by step-and-repeat ultraviolet nanoimprint lithography

Journal of Micro/Nanolithography MEMS and MOEMS (2014)

Giuseppe C. Calafiore Scott Dhuey Simone Sassolini Nerea Alayo D. C. Gosselin

Numerous studies report the importance of nanoscale metallic features to increase the sensitivity of gas sensors, biodetectors, and for the fabrication of the new-generation plasmonic devices. So far, nanoimprint lithography has not shown the capability to pattern a metallic structure that would both be sub-15 nm and sufficiently thick to ensure electrical conductance. To overcome these limitations, we report a step and repeat nanoimprint lithography (SR-NIL) on a pre-spin-coated layer stack. This work reports the fabrication of sub-15-nm lines that are 15-nm thick and have a 50-nm-half-pitch grating with 35-nm-thick metal, which represents the new state of the art for SR-NIL.

Nanoimprint lithography

Next-generation lithography

Ultraviolet

10.1117/1.jmm.13.3.033013

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Citations (9)