Maik Menzel

Fraunhofer Institute for Material and Beam Technology

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Stefan Braun

TU Wien

Andreas Leson

Fraunhofer Institute for Material and Beam Technology

Peter Gawlitza

Fraunhofer Institute for Material and Beam Technology

K. Wagner

The University of Texas at Austin

D. Weißbach

AXO Dresden (Germany)

Adam Kubec

Paul Scherrer Institute

Thomas Foltyn

Advanced Micro Devices (Canada)

Stefan Schädlich

Fraunhofer Institute for Material and Beam Technology

Reiner Dietsch

AXO Dresden (Germany)

Thomas Holz

AXO Dresden (Germany)

Cooperative Institutions

Fraunhofer Institute for Material and Beam Technology

Fraunhofer Society

TU Dresden

Heidelberg University

AXO Dresden (Germany)

Argonne National Laboratory

Fraunhofer Institute for Nondestructive Testing

European Synchrotron Radiation Facility

Heidelberg University

Deutsches Elektronen-Synchrotron DESY

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Carbon buffer layers for smoothing substrates of EUV and x-ray multilayer mirrors

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (2004)

Stefan Braun Beatrice Bendjus Thomas Foltyn Maik Menzel J. Schreiber

Smoothing of surfaces by thin film deposition is facilitated by methods which release hyperthermal particles on the substrate. One of these techniques is pulsed laser deposition (PLD), with high kinetic particle energies of up to several 100 eV. The concrete energy distribution of the particles can be widely influenced by the laser power density. We investigated the deposition of carbon layers by PLD on numerous substrates with rms-roughnesses between 0.15 and 0.75 nm using different laser power densities and film thicknesses. It turns out that a better smoothing can be obtained with higher laser power densities, whereby diamond-like carbon films are created. With typical thicknesses of d_C = 100 nm, the rms-roughness is reduced from 0.75 nm to 0.55 nm and from 0.32 nm to 0.18 nm. Accordingly by applying smoothing carbon buffer layers, the EUV reflectance of Mo/Si multilayers on rough substrates is increased from typically 60% to > 65% on substrates with initial roughnesses of 0.75 nm.

Extreme Ultraviolet Lithography

Pulsed Laser Deposition

Smoothing

Carbon fibers

Deposition

Diamond-like carbon

10.1117/12.541365

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Citations (1)

Ion beam sputtering of x-ray multilayer mirrors

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (2008)

Peter Gawlitza Stefan Braun Georg Dietrich Maik Menzel Stefan Schädlich

Ion beam sputtering has been applied for polishing, figuring and multilayer coating on silicon and quartz glass substrates for the fabrication of x-ray mirrors. For high-performance x-ray optics extremely low microroughnesses of the substrates have to be achieved. Particularly for low d-spacing multilayers (d = 1...2 nm) even small improvements of the surface quality result in significant performance gains of the mirrors. By ion beam polishing silicon substrate surfaces could be smoothed from 0.18 nm rms to 0.11 nm rms (AFM scan length = 5 μm). Furthermore figuring of spherical substrates into elliptical or parabolic surface contours has been developed and applied. Spherical quartz glass substrates with initial rms roughnesses of 0.73 nm and 0.52 nm show reduced roughnesses after figuring and multilayer coating of 0.26 nm and 0.10 nm using AFM scan lengths of 20 μm and 5 μm, respectively. The testing of the ion beam figured mirrors for the application as parallel beam and focussing optics shows very promising results: The comparison of collimating mirrors, produced either by ion beam figuring or bending, shows very similar x-ray intensities. However, the ion beam figured mirrors open the perspective for further reduced figure errors, improved long-term stability and 2-dimensional focusing.

10.1117/12.796830

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Citations (6)

Specific aspects of roughness and interface diffusion in non-periodic Mo/Si multilayers

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (2014)

Stefan Braun Peter Gawlitza Maik Menzel Wolfgang Friedrich Jürgen Schmidt

Most of the currently used reflective coatings for EUV and X-ray mirrors are periodic nanometer multilayers. Depending on the number of periods and the absorption in the multilayer stack a certain band width of the incoming radiation can be reflected. In order to increase the integral reflectance or to accept larger ranges of incidence angles, non-periodic multilayers are needed. With the transition from periodic to non-periodic multilayers new challenges arise for the deposition process. Since the reflectance spectra are sensitive to every single layer thickness a precise coating control and an exact knowledge of the interface reactions are required. Furthermore substrate roughness influences the reflectance spectra. With an advanced coating process using additional ion bombardment during thin film growth the integrated reflectance of broadband mirrors can be conserved even for an initial substrate roughness of about 0.7 nm rms.

Extreme Ultraviolet Lithography

Deposition

10.1117/12.2062193

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Citations (2)

Smoothing of substrate roughness by carbon-based layers prepared by pulsed laser deposition (PLD)

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (2004)

Stefan Braun Beatrice Bendjus Thomas Foltyn Maik Menzel J. Schreiber

In order to obtain high reflectance of EUV and X-ray multilayer mirrors, highly polished substrate surfaces with rms roughness σ_rms = 0,1-0.2 nm are necessary. However, the simultaneous achievement of low micro-roughness and precise surface figure is very challenging and often not accomplished. Therefore deposition techniques capable to deposit layers with smoothing properties are very desirable. One potential method that enables the formation of such layers is the pulsed laser deposition (PLD). This technique generates particles with high kinetic energies of up to several 100 eV. We investigated the deposition of carbon based smoothing layers by PLD on numerous substrates with roughness between σ_rms = 0.15 and 0.75 nm using different laser power densities and film thicknesses. Besides pure carbon layers we also used metal/carbon (metal = Ni, W, Pt) multilayers with respect to their capabilities to smooth surface roughness. As a general trend it turns out that a better smoothing can be obtained with higher laser power densities, whereby diamond-like carbon films are created. Furthermore, the intrinsic stress of the smoothing layers has been investigated. Due to the high kinetic energy of the impinging particles during the film growth, the layers show compressive stress. The degree of the stress depends on the concrete metal that is combined with carbon in the multilayer stack. Up to now the lowest compressive stress is obtained with Ni/C multilayers.

Pulsed Laser Deposition

Deposition

Smoothing

Carbon fibers

Extreme Ultraviolet Lithography

10.1117/12.560358

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Citations (1)

Precision Multilayer Coating for Large High-End Mirrors

SVC ... Annual Technical Conference proceedings - Society of Vacuum Coaters. Technical Conference/Proceedings of the annual technical conference/Society of Vacuum Coaters Technical Conference proceedings (2015)

R. Mueller A. Luca A. Eibsich J. Landrock J. Mai

10.14332/svc15.proc.1901

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Preparation and characterization of multilayers for EUV applications

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (2005)

Th. Foltyn Stefan Braun Wolfgang Friedrich Andreas Leson Maik Menzel

The dependency of EUV reflectance and of the stress present in Mo/Si/C multilayers on the constituent individual layers has been investigated. The heat treatment of highly EUV reflective Mo/Si/C multilayers has been examined in terms of annealing time and temperature. Irreversible stress change was found at annealing temperatures above 130 °C, where the change of period thickness and the change of stress increase more rapidly. It was found, that there is a saturation of stress change depending on the annealing time. Annealing at 100 °C reveals a saturation of stress change after 10 h, whereas annealing at 150 °C still shows stress reduction after 50 h. A second annealing of two samples shows a reversible stress-temperature behavior of the multilayers. Stress compensation layers for the coating of stress-mitigated Mo/Si/C multilayers were developed. The best results of composition for reflective multilayers and stress-compensation multilayers were joint together in order to fabricate stress-mitigated Mo/Si/C multilayers. Taking the condition of achieving an overall stress below ±100-150 MPa into account, two types of stress-mitigated multilayers were coated. The first type includes a buffer layer in order to compensate the compressive stress of the reflective multilayers without annealing. The stress was reduced to -76 MPa by keeping a high EUV near-normal incidence reflectance of ~70.0 %. The second type contains a thinner buffer layer and the stress reduction of the complete multilayer system was assisted by a post-annealing at 100 °C for 10 h. The stress was measured to be -108 MPa and an EUV reflectance of 69.5 % was obtained.

Extreme Ultraviolet Lithography

10.1117/12.626116

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Ash content determination of cokes with low ash content

K. Wagner F. Prutschin Maik Menzel Bertram Kraus I. Ritter

Content (measure theory)

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Citations (1)

The Mu3e experiment: Toward the construction of an HV-MAPS vertex detector

T. Rudzki Heiko Augustin Marin Deflorin S. J. Dittmeier Florian Frauen

The Mu3e experiment searches for the lepton flavor violating decay $\mu^+~\rightarrow~e^+~e^+~e^-$ with an ultimate aimed sensitivity of 1 event in $10^{16}$ decays. This goal can only be achieved by reducing the material budget per tracking layer to $X/X_0 \approx 0.1 \%$. High-Voltage Monolithic Active Pixel Sensors (HV-MAPS) which are thinned to 50 μm serve as sensors. Gaseous helium is chosen as coolant. Results of recent studies related to the sensor prototypes, the helium cooling, and module prototyping are presented. The recent chip submission MuPix10 has proven its functionality regarding efficiency and time resolution. The helium cooling system for the inner tracker could be verified using a full-scale prototype. A complete prototype equipped with MuPix10 chips will be tested inside the Mu3e magnet in summer 2021.

Tracking (education)

Source

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Reflectance and Resolution of Multilayer Monochromators for Photon Energies from 400 – 6000 eV

AIP conference proceedings (2007)

Stefan Braun Peter Gawlitza Maik Menzel Andreas Leson M. Mertin

This paper deals with multilayer monochromators for synchrotron beamlines that are produced by magnetron and ion beam sputter deposition (MSD and IBSD). Different material combinations (W/B4C, W/Si, Mo/B4C, Mo/Si) with period thicknesses between 1 nm and 10 nm have been fabricated and measured at the synchrotron BESSY II (optics and KMC1 beamlines). The main challenge for the deposition of nanometer multilayers is to find growth conditions where the interfaces between adjacent layers are abrupt (no interdiffusion σd) and smooth (no roughness σr). The interface width σ (σ2 = σd2 + σr2) becomes increasingly important for smaller period thicknesses. One decisive point for the interface formation is the kinetic energy distribution of the particles arriving on the substrate surface. In MSD, the sputter gas pressure is the main parameter for influencing the kinetic energy of the particles. In IBSD, an assist ion beam source can be used to bombard the growing film with inert gas atoms of a specific energy. Using this option, the best compromise between low interdiffusion and low roughness can be found for every material combination. Investigations of the reflection of W/B4C multilayers with period thicknesses of 1.2 nm and number of periods N = 50, 300 and 600 show that no roughness increase occurs with increasing N. Typical values for the interface widths are σ = 0.27…0.28 nm.

Deposition

Reflection

10.1063/1.2436106

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Citations (11)

Calculated efficiencies of three-material low stress coatings for diffractive x-ray transmission optics

AIP conference proceedings (2016)

Adam Kubec Stefan Braun Peter Gawlitza Maik Menzel Andreas Leson

Diffractive X-ray optical elements made by thin film coating techniques such as multilayer Laue lenses (MLL) and multilayer zone plates (MZP) are promising approaches to achieve resolutions in hard X-ray microscopy applications of less than 10 nm. The challenge is to make a lens with a large numerical aperture on the one hand and a decent working distance on the other hand. One of the limiting factors with the coated structures is the internal stress in the films, which can lead to significant bending of the substrate and various types of unwanted diffraction effects. Several approaches have been discussed to overcome this challenge. One of these is a three-material combination such as Mo/MoSi2/Si, where four single layers per period are deposited. Mo and Si represent the absorber and spacer in this case while MoSi2 forms a diffusion barrier; in addition the thicknesses of absorber and spacer are chosen to minimize residual stress of the overall coating. Here the diffraction efficiency as well as the profile of the beam in the focal plane are discussed in order to find a tradeoff between lowest residual stress and best diffraction properties.

X-ray optics

Numerical aperture

Aperture (computer memory)

10.1063/1.4952882

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Citations (2)