We present the results of 13C nuclear magnetic resonance (NMR) measurements that probe molecular orientational dynamics in solid C70 in the temperature range 223–343 K. Orientational dynamics affect the NMR line shapes and spin–lattice relaxation rates by modulating the 13C chemical shift anisotropy (CSA). Motionally averaged CSA line shapes, determined from both one-dimensional and two-dimensional magic angle spinning NMR spectra, and relaxation rates are determined for each of the five inequivalent carbon sites in the C70 molecule. Comparisons of the results for the five sites provide evidence for rapid uniaxial molecular reorientation in the monoclinic (T≤280 K) and rhombohedral (280≤T≤330 K) phases and rapid isotropic reorientation in the face-centered cubic (T≥330 K) phase. The orientational correlation time is roughly 2 ns at 250 K and of the order of 5 ps at 340 K.
ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTDetermination of Monomer Conformations in Noncrystalline Solid Polymers by Two-Dimensional NMR Exchange SpectroscopyGary Dabbagh, David P. Weliky, and Robert TyckoCite this: Macromolecules 1994, 27, 21, 6183–6191Publication Date (Print):October 1, 1994Publication History Published online1 May 2002Published inissue 1 October 1994https://pubs.acs.org/doi/10.1021/ma00099a038https://doi.org/10.1021/ma00099a038research-articleACS PublicationsRequest reuse permissionsArticle Views122Altmetric-Citations55LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InRedditEmail Other access optionsGet e-Alertsclose Get e-Alerts
Using terpolymers of Poly(norbornene-alt-malefic anhydride-co-acrylic acid) [P(NB/MA/AA)], the dissolution inhibition mechanism for two types of common additives in 193nm resist formulations, tert-butylcarboxylate (e.g. tert-butyl cholate) dissolution inhibitors (DI) and onium salt photoacid generators (PAC's) were examined. For simple cholate ester derivatives, increasing interactions with maleic anhydride repeating units paralleled the dissolution inhibition (tert-butyllithocholate>tert-butyldeoxycholate>tert-butylcholate). For a wider range of cholate derivatives, increasing hydrophobicity as measured by logPoct or the cloud point formation in water/acetone mixtures, is a good predictor of increased dissolution inhibition. Increases in dissolution promotion appeared to track with the number of carboxylic acid moieties and the hydrophobicity of carboxylic acid moieties released upon acidolytic cleavage of carboxylate esters. Finally, for onium salt PAC's, increasing the size of fluorinated anions decreased dissolution inhibition. This may be because these anions offer more steric hindrance, which disfavors interactions with the terpolymer matrix. The nature of this interaction may be that of a PAG with carboxylic acid as judged from modeling studies with acetic acid in which increasing strength of the interaction correlated with increased dissolution inhibition (triflate>nonaflate> perflurooctanesulfonate)
ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTPhotoelectrochemical behavior of C60 filmsB. Miller, J. M. Rosamilia, G. Dabbagh, R. Tycko, R. C. Haddon, A. J. Muller, W. Wilson, D. W. Murphy, and A. F. HebardCite this: J. Am. Chem. Soc. 1991, 113, 16, 6291–6293Publication Date (Print):July 1, 1991Publication History Published online1 May 2002Published inissue 1 July 1991https://doi.org/10.1021/ja00016a067Request reuse permissionsArticle Views397Altmetric-Citations110LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InReddit PDF (418 KB) Get e-Alertsclose Get e-Alerts
Over a period of last several years 193 nm immersion lithography from a remote and unlikely possibility gradually became a reality in many fabrication facilities across the globe and solid candidate for high volume manufacturing for the next generation technology node. It is being widely understood in the industry that top-coatless resist approach is a desirable final stage of the immersion process development. However creating low-defect high performance top-coatless resist materials requires understanding of the fundamental material properties of the top layer, responsible for leaching suppression, immersion fluid meniscus stability, and in this way enabling high speed low-defect scanning. While a lot of progress has been made in implementing specific top coat materials into the process flow, clear understanding effects of the top coat properties on the lithographic conditions and printing capability is still lacking. This paper will discuss top coat materials design, properties and functional characteristics in application to novel fluoroalcohol polymer-based immersion top coat. We have used our fluoroalcohol based-series designs (titled MVP top coat materials further on in the paper) as a test vehicle for establishing correlations between top coat performance and its physical and chemical properties including hydrophobicity, molecular weight/dispersity etc. Effects of polymer-solvent interactions on the contact angle and characteristics of the top coat material are explored, providing valuable understanding transferable to design of new generation top coats and top-coatless materials. Our resultant new designs demonstrated excellent lithographic performance, profiles and low leaching levels with commercially available resist and high receding contact angles, comparable to the commercial top coat materials.
Plasma polymerized methylsilane (PPMS) films exposed to UV light in the presence of air undergo photo-oxidation to produce a glass-like material, PPMSO, which can be selectively removed using aqueous HF based chemistries. We find that PPMS, used in such positive tone imaging processes, suffers from several drawbacks which make it an unattractive candidate for use as an imaging layer in positive tone resist schemes. We have used infrared and X- ray photoelectron spectroscopy to characterize the PPMS films. We have found evidence for the presence of bridging methylene groups in the Si-Si backbone of the PPMS polymer at the PPMS/Substrate interface. This thin underlayer of a polycarbosilane material is initially deposited in the PPMS CVD process and is insoluble in aqueous or vapor HF contributing to residue after the development. The limitation as to how rapidly PPMS films can be photo- oxidized in the presence of air using high-fluence laser steppers is determined by the rate of oxygen diffusion into the PPMS films during exposure. This reciprocity failure exhibited by PPMS films may limit positive tone PPMS processing from consideration in high-throughput UV based lithography.
Abstract Die Umsetzung von (I) mit (II) unter physiologischen Bedingungen (pH 7‐8, 25°C) führt zu den Bicyclononan‐Derivaten (III) neben den Phenolen (IV).
ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTNew copper chemistry. 18. Reaction of Bu2CuLi.cntdot.LiI with alkyl iodides: evidence for free radicals and electron transferSteven H. Bertz, G. Dabbagh, and A. M. MujsceCite this: J. Am. Chem. Soc. 1991, 113, 2, 631–636Publication Date (Print):January 1, 1991Publication History Published online1 May 2002Published inissue 1 January 1991https://pubs.acs.org/doi/10.1021/ja00002a035https://doi.org/10.1021/ja00002a035research-articleACS PublicationsRequest reuse permissionsArticle Views371Altmetric-Citations32LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InRedditEmail Other access optionsGet e-Alertsclose Get e-Alerts
