Laixi Sun

China Academy of Engineering Physics

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Xin Ye

China Academy of Engineering Physics

Jin Huang

Shanghai Pudong New Area Gongli Hospital

Wanguo Zheng

Chongqing University

Hongjie Liu

China Academy of Engineering Physics

Weidong Wu

Shanxi Academy of Medical Sciences

Xiaodong Jiang

Qingdao University

Liming Yang

China West Normal University

Fengrui Wang

Huaiyin Institute of Technology

Ting Shao

China Academy of Engineering Physics

Feng Geng

Sinopec (China)

Cooperative Institutions

China Academy of Engineering Physics

Laser Fusion Research Center

Laser Research Institute

Chinese Academy of Sciences

Southwest University of Science and Technology

Shanghai Jiao Tong University

Harbin Institute of Technology

Sichuan University

Mianyang Normal University

Nanjing University of Science and Technology

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Surface modification and etch process optimization of fused silica during reaction CHF3–Ar plasma etching

Optik (2015)

Laixi Sun Jin Huang Xin Ye Hongjie Liu Fengrui Wang

Surface Modification

Plasma Etching

10.1016/j.ijleo.2015.10.046

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Citations (16)

Fabrication of Antireflective Nanostructures on a Transmission Grating Surface Using a One-Step Self-Masking Method

Nanomaterials (2019)

Ting Shao Feng Tang Laixi Sun Xin Ye Junhui He

Suppression of Fresnel reflection from diffraction grating surfaces is very important for many optical configurations. In this work, we propose a simple method to fabricate subwavelength structures on fused-silica transmission grating for optical antireflection. The fabrication is a one-step self-masking reaction ion etching (RIE) process without using any masks. According to effective medium theory, random cone-shaped nanopillars which are integrated on the grating surface can act as an antireflective layer. Effects of the nanostructures on the reflection and transmission properties of the grating were investigated through experiments and simulations. The nanostructure surface exhibited excellent antireflection performance, where the reflection of the grating surface was suppressed to zero over a wide range of incident angles. Results also revealed that the etching process can change the duty cycle of the grating, and thus the diffraction orders if there are oblique lateral walls. The simulation results were in good agreement with the experimental ones, which verified our physical comprehension and the corresponding numerical model. The proposed method would offer a low-cost and convenient way to improve the antireflective performance of transmission-diffractive elements.

Anti-reflective coating

Fresnel equations

Nanopillar

Diffraction efficiency

10.3390/nano9020180

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Citations (20)

The influence of the Talbot effect on the application performance of beam sampling grating in high power laser devices

Optics & Laser Technology (2024)

Hongjie Liu Fang Wang Yuan Chen Laixi Sun Tianran Zheng

Talbot effect

10.1016/j.optlastec.2024.111553

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KOH-based shallow etching for exposing subsurface damage and increasing laser damage resistance of fused silica optical surface

Optical Materials (2020)

Laixi Sun Ting Shao Xinda Zhou Fenfei Li Shufan Chen

Potassium hydroxide

Dry etching

Isotropic etching

10.1016/j.optmat.2020.110249

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Citations (15)

The effect of RIE-modified surface contamination on optical performance of fused silica

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (2013)

Laixi Sun Hongjie Liu Jin Huang Xin Ye Qiang Cheng

A series of fused silica surface have been created by reaction ion etching to determine the effect of the contamination level on surface state and optical performance of the optics. The results show that both impurity elements contamination and scratches of fused silica surface can be removed dramatically during RIE process. The laser induced damage threshold is raised by 37.6% when the polishing layer is removed for a thickness of 6μm, and the laser weak absorption doesn't increase obviously. The results can provide technique support for improving laser induced damage performance of fused silica.

10.1117/12.2020381

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Citations (5)

Formation of broadband antireflective and superhydrophilic subwavelength structures on fused silica using one-step self-masking reactive ion etching

Scientific Reports (2015)

Xin Ye Xiaodong Jiang Jin Huang Feng Geng Laixi Sun

Fused silica subwavelength structures (SWSs) with an average period of ~100 nm were fabricated using an efficient approach based on one-step self-masking reactive ion etching. The subwavelength structures exhibited excellent broadband antireflection properties from the ultraviolet to near-infrared wavelength range. These properties are attributable to the graded refractive index for the transition from air to the fused silica substrate that is produced by the ideal nanocone subwavelength structures. The transmittance in the 400-700 nm range increased from approximately 93% for the polished fused silica to greater than 99% for the subwavelength structure layer on fused silica. Achieving broadband antireflection in the visible and near-infrared wavelength range by appropriate matching of the SWS heights on the front and back sides of the fused silica is a novel strategy. The measured antireflection properties are consistent with the results of theoretical analysis using a finite-difference time-domain (FDTD) method. This method is also applicable to diffraction grating fabrication. Moreover, the surface of the subwavelength structures exhibits significant superhydrophilic properties.

Anti-reflective coating

10.1038/srep13023

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Citations (61)

Traceless mitigation of laser damage precursors on a fused silica surface by combining reactive ion beam etching with dynamic chemical etching

RSC Advances (2018)

Laixi Sun Ting Shao Jianfeng Xu Xiangdong Zhou Xin Ye

HF-based etching has been successful in mitigating damage precursors on the surface of fused silica optics used in high power lasers. However, wet etching generally leaves an etching trace leading to surface roughness, which seriously degrades laser beam quality (e.g., transmission loss and wave-front degradation). A way of addressing this issue is to apply plasma etching as a preprocessing step before HF etching, but so far very few studies have provided a practical scheme for engineering applications. In this work, we proposed a novel two-step scheme by combining reactive ion beam etching with dynamic chemical etching techniques. We demonstrate the combined scheme is capable of tracelessly mitigating the laser damage precursors on a fused silica surface. The 0% probability damage threshold obtained by combined etching is 1.4 times higher than that obtained by HF-based etching. The study opens a new approach towards high damage-resistant optics manufacturing and provides the potential possibility of exploring extreme interactions between high-power lasers and matter.

Dry etching

Plasma Etching

Isotropic etching

10.1039/c8ra06759g

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Citations (8)

Combining laser-induced fluorescence and light-scattering microscopies to diagnose low-fluence damage precursors on KDP-based crystal surface

Optical Engineering (2024)

Qinghua Deng Laixi Sun Jin Huang Fengrui Wang Xiaoyan Zhou

The maximal output fluence of high-power laser systems remains limited by KH2PO4 (KDP)-based optical components used to convert the infrared pulses to 3ω pulses. The correlation between optical defects (scales of a few micrometers) on KDP crystal surfaces and damage initiation was systematically investigated by combining laser-induced fluorescence (FL) and light-scattering microscopies incorporated an in-situ damage testing facility (wavelength at 355 nm and pulse width of 7 ns). We demonstrated that the surface defects featuring both FL and light-scattering have a high propensity to damage. The scattering feature of the FL precursors was found to be a key factor for damage initiation, whose physical mechanism was thoroughly revealed. The results further implied that the removal of such damage precursors can greatly improve the damage resistance of KDP-based crystals. Considering that this combined imaging technique is noninvasive, the results establish this methodology as an attractive and non-destructive tool for evaluating and improving the surface damage performance of KDP-based crystals used in high-power lasers.

Crystal (programming language)

10.1117/1.oe.63.2.025107

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Design optimization and antireflection of silicon nanowire arrays fabricated by Au-assisted chemical etching

Materials Science in Semiconductor Processing (2018)

Bin Li Gao Niu Laixi Sun Yao Lu Chaoyang Wang

Nanosphere lithography

Isotropic etching

Black silicon

10.1016/j.mssp.2018.03.026

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Citations (16)

High power laser antireflection subwavelength grating on fused silica by colloidal lithography

Journal of Physics D Applied Physics (2016)

Xin Ye Jin Huang Feng Geng Hongjie Liu Laixi Sun

In this study we report on an efficient and simple method to fabricate an antireflection subwavelength grating on a fused silica substrate using two-step reactive ion etching with monolayer polystyrene colloidal crystals as masks. We show that the period and spacing of the obtained subwavelength grating were determined by the initial diameter of polystyrene microspheres and the oxygen ion etching duration. The height of pillar arrays can be adjusted by tuning the second-step fluorine ion etching duration. These parameters are proved to be useful in tailoring the antireflection properties of subwavelength grating using a finite-difference time-domain (FDTD) method and effective medium theory. The subwavelength grating exhibits excellent antireflection properties. The near-field distribution of the SWG which is directly patterned into the substrate material is performed by a 3D-FDTD method. It is found that the near-field distribution is strongly dependent on the periodicity of surface structure, which has the potential to promote the ability of anti-laser-induced damage. For 10 ns pulse duration and 1064 nm wavelength, we experimentally determined their laser induced damage threshold to 32 J cm−2, which is nearly as high as bulk fused silica with 31.5 J cm−2.

Polystyrene

10.1088/0022-3727/49/26/265104

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Citations (36)