Chemical amplification processes have been reported to be useful in the development of sensitive, high resolution photoresists. Acids, photochemically generated from onium salt precursors, catalytically remove a protective group from substituted hydroxystyrene polymers. Nonionic, acid precursors based on 2-nitrobenzyl ester photochemistry have been developed that have utility in resist applications. Several resist systems capable of imaging via chemical amplification processes have been evaluated in terms of their materials and lithographic properties. Resist with sensitivities ranging from ~15 to 150 mJ/cm2 in the deep-UV region have been prepared and 0.5 μm resolution has been demonstrated.
ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTPhotodissociation of butyrophenone cation. Ionic analogs of Norrish type I and II reactionsRobert Gooden and John I. BraumanCite this: J. Am. Chem. Soc. 1977, 99, 6, 1977–1978Publication Date (Print):March 1, 1977Publication History Published online1 May 2002Published inissue 1 March 1977https://pubs.acs.org/doi/10.1021/ja00448a052https://doi.org/10.1021/ja00448a052research-articleACS PublicationsRequest reuse permissionsArticle Views148Altmetric-Citations14LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InRedditEmail Other access optionsGet e-Alertsclose Get e-Alerts
Abstract Thermal oxidations at 101°C of ethylene‐carbon monoxide (E/CO) copolymer and low‐density polyethylene (DYNK) were studied over the range of 0–30 mL oxygen absorbed per gram of polymer. Relative changes in reaction rates, chemical composition, and molecular weights of the polymers were observed using oxygen uptake, infrared spectroscopy, and gel permeation chromatography. At comparable oxidation rates, differences in concentrations of most functional groups appeared to be small, except for the IR peak attributed to non‐hydrogen‐bonded hydroperoxide which was absent in the spectrum of E/CO copolymer. The extent of scission at comparable oxygen absorption was greater in E/CO than DYNK, since ketonic carbonyl groups were oxidized faster than methylene groups.
ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTEffects of elongation on the photochemistry of poly(ethylene-co-carbon monoxide)Robert Gooden, Don D. Davis, Molly Y. Hellman, Andrew J. Lovinger, and Field H. WinslowCite this: Macromolecules 1988, 21, 5, 1212–1217Publication Date (Print):May 1, 1988Publication History Published online1 May 2002Published inissue 1 May 1988https://pubs.acs.org/doi/10.1021/ma00183a005https://doi.org/10.1021/ma00183a005research-articleACS PublicationsRequest reuse permissionsArticle Views75Altmetric-Citations19LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InRedditEmail Other access optionsGet e-Alertsclose Get e-Alerts
ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTDeep-UV lithographic response and quantum efficiency calculations of poly((trimethylsilyl)methyl Methacrylate-(chloromethyl)styrene) copolymersM. J. Jurek, A. E. Novembre, I. P. Heyward, R. Gooden, and E. ReichmanisCite this: Chem. Mater. 1989, 1, 5, 509–514Publication Date (Print):September 1, 1989Publication History Published online1 May 2002Published inissue 1 September 1989https://pubs.acs.org/doi/10.1021/cm00005a009https://doi.org/10.1021/cm00005a009research-articleACS PublicationsRequest reuse permissionsArticle Views51Altmetric-Citations-LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InRedditEmail Other access optionsGet e-Alertsclose Get e-Alerts
ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTPhotodissociation of stilbene radical cationRobert Gooden and John I. BraumanCite this: J. Am. Chem. Soc. 1982, 104, 6, 1483–1486Publication Date (Print):March 1, 1982Publication History Published online1 May 2002Published inissue 1 March 1982https://doi.org/10.1021/ja00370a006RIGHTS & PERMISSIONSArticle Views229Altmetric-Citations19LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InReddit PDF (509 KB) Get e-Alerts Get e-Alerts
ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTPhotooxidation of trichlorosilane in silicon tetrachlorideRobert GoodenCite this: Inorg. Chem. 1983, 22, 16, 2272–2275Publication Date (Print):August 1, 1983Publication History Published online1 May 2002Published inissue 1 August 1983https://pubs.acs.org/doi/10.1021/ic00158a010https://doi.org/10.1021/ic00158a010research-articleACS PublicationsRequest reuse permissionsArticle Views120Altmetric-Citations8LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InRedditEmail Other access optionsGet e-Alertsclose Get e-Alerts
