Self-supported one-dimensional (1D) core/shell nanostructures (SS1DCSNs) offer multiple inherent advantages in the field of electrochromism, establishing them as a prominent emerging technology. This review categorizes SS1DCSNs into self-supported 1D nanostructures...
The Pb1−xNixBiO2Br (x = 0, 0.1, 0.2, 0.3, 0.4) semiconductor materials were synthesized via a hydrothermal method. The samples were characterized by x-ray diffraction (XRD), x-ray photoelectron spectroscopy (XPS), field-emission scanning electron microscopy (FE-SEM), transmission electron microscopy (TEM), Fourier transform infrared spectroscopy (FTIR), ultraviolet-visible diffuse reflection spectroscopy (UV–vis DRS) and photoluminescence (PL) spectroscopy. The results show that the Ni-doped PbBiO2Br samples are composed of flower-like nanosheets. Ni ions are confirmed to enter the PbBiO2Br lattice and do not cause the crystal structure changes of PbBiO2Br, basically maintaining the tetragonal structure. The absorption edge is shifted to higher wavelength, and the corresponding energy gap decreases from 2.49 eV for pristine PbBiO2Br to 2.30 eV for Ni-doped PbBiO2Br, and the gradual shift of the FTIR peaks toward lower frequency is observed of the Ni-doped PbBiO2Br. The PL absorption peaks shift toward the bluish-violet wavelength and their intensity gradually decreases with increasing the Ni content. These can be related to the creation of local defects and further confirm that Ni2+ ions are indeed included into the PbBiO2Br lattice. The synthesized Ni-doped PbBiO2Br nanosheets are expected to be more efficient photocatalytic materials
In the absence of additional oxygen, thin films of tungsten (VI) oxide (WO 3 ) were prepared on indium-doped tin oxide conductive glass substrates by radio-frequency (RF) magnetron sputtering. The effects of sputtering power, working air pressure, substrate bias voltage and substrate temperature on the surface morphology, microstructure, optical properties and electrochromic (EC) performance of the films were systematically investigated. The research shows that a sputtering power of 80–100 W can ensure a moderate deposition rate of ∼10 −2 nm/s and help obtain non-dense films. Similarly, a working air pressure of 1.0 Pa also leads to the deposition of loose films, which is beneficial for the improvement of the optical transmittance and EC performance of tungsten (VI) oxide thin films. The applied substrate bias has little effect on the optical properties, but it will degrade the coloring and/or bleaching efficiency of tungsten (VI) oxide thin films and greatly reduce their optical modulation. When the substrate temperature rises to 600°C, the film begins to crystallize and exhibits a rod-patterned porous structure, which leads to a small increase in the optical modulation.
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