Ch. Ammon

Friedrich-Alexander-Universität Erlangen-Nürnberg

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Hans‐Peter Steinrück

Friedrich-Alexander-Universität Erlangen-Nürnberg

Georg Held

Diamond Light Source

A. Bayer

Friedrich-Alexander-Universität Erlangen-Nürnberg

E. Umbach

University of Würzburg

Th. Gleim

University of Würzburg

Clemens Heske

University of Nevada, Las Vegas

Matthias Probst

Karlsruhe Institute of Technology

Thomas Schmidt

Fritz Haber Institute of the Max Planck Society

J. Pantförder

Friedrich-Alexander-Universität Erlangen-Nürnberg

W. Faschinger

University of Würzburg

Cooperative Institutions

Friedrich-Alexander-Universität Erlangen-Nürnberg

University of Würzburg

Turku University Hospital

University of Turku

Committee on Publication Ethics

Universitätsklinikum Erlangen

Karlsruhe Institute of Technology

Federal Institute for Geosciences and Natural Resources

Fritz Haber Institute of the Max Planck Society

Universitat de Barcelona

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Dissociation and oxidation of methanol on Cu()

Surface Science (2002)

Ch. Ammon A. Bayer Georg Held B. Richter Thomas Schmidt

Methyl formate

10.1016/s0039-6028(02)01361-4

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Citations (71)

Formation of the ZnSe/(Te/)GaAs() heterojunction

Surface Science (2003)

Th. Gleim Clemens Heske E. Umbach C. Schumacher Samanta da Silva Gündel

Band offset

Lattice (music)

10.1016/s0039-6028(03)00439-4

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Citations (38)

Adsorption and Reaction of Methanol on Clean and Oxygen Precovered Cu(111)

Zeitschrift für Physikalische Chemie (2004)

S. Pöllmann A. Bayer Ch. Ammon Hans‐Peter Steinrück

Abstract The adsorption of methanol on the clean and oxygen precovered Cu(111) surface was studied by means of high resolution X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS), and temperature programmed desorption (TPD). On clean Cu(111) methanol is adsorbed molecularly at 100 K. Only small amounts of methoxy are formed by heating to 160–180 K, whereas the main part of methanol desorbs molecularly. The formation of methoxy drastically increases on the oxygen precovered surface. In the UP spectra the peaks of molecular methanol disappear and the peaks of methoxy develop. TPD measurements show that methoxy desorbs dissociatively as formaldehyde and hydrogen with the rate maxima at around 430 K. The efficiency of the oxidation of methanol to formaldehyde depends on the amount of predosed oxygen, with a maximum methoxy coverage obtained for an oxygen precoverage of 0.18 ML. From the quantitative analysis we propose an additional reaction pathway involving not only the formation, but also the decomposition of an hydroxyl intermediate, parallel to the previously reported pathway, which leads to the desorption of water.

Thermal desorption spectroscopy

10.1524/zpch.218.8.957.35981

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Segregation effects and chemical properties of nickel monolayers on Cu(111)

Surface Science (2001)

R. Domnick Georg Held H. Koschel Ch. Ammon Hans‐Peter Steinrück

Low-energy electron diffraction

Atmospheric temperature range

10.1016/s0039-6028(01)00717-8

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Citations (7)

Mont Terri Project - Heater experiment : rock and bentonite thermo-hydro-mechanical (THM) processes in the near field of a thermal source for development of deep underground high level radioactive waste repositories

I. Goebel H.-J. Alheid Kaufhold Michael Naumann Th. Pletsch

Bentonite

High-level waste

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Influence of As passivation on the electronic level alignment at BeTe/Si(111) interfaces

Physical review. B, Condensed matter (2003)

Th. Gleim L. Weinhardt Thomas Schmidt R. Fink Clemens Heske

We have investigated the influence of As substrate passivation on the electronic level alignment of the heterovalent BeTe/Si(111) interface. Employing photoelectron spectroscopy, we have performed k-resolved measurements at selected excitation energies in the uv range to maximize the contribution from the \ensuremath{\Gamma} point for a correct determination of the valence band maximum. These results are compared with k-integrated data using a density-of-states function from density functional theory. For BeTe(100) and BeTe(111), we find a negligible influence of surface orientation on the position of the valence band maximum. The As passivation increases the valence band offset by 0.24 eV (\ifmmode\pm\else\textpm\fi{}0.13 eV) compared to BeTe on an unpassivated Si substrate, thus leading to a significantly increased step in the valence band $(0.37\ifmmode\pm\else\textpm\fi{}0.13\mathrm{eV}).$ The results are discussed with respect to the barriers for electron and hole injection in heterostructures and with respect to the interface structure.

Passivation

10.1103/physrevb.67.205315

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Formation of a new type of chromium oxide by deposition of chromium onto water precovered Cu(111)

Surface Science (2001)

J. Pantförder R. Domnick Ch. Ammon Georg Held Hans‐Peter Steinrück

Chromium oxide

Deposition

10.1016/s0039-6028(01)01001-9

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Citations (11)