Akihiro Matsutani

Tokyo Institute of Technology

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Co-Authors

Fumio Koyama

Tokyo Institute of Technology

284

Kenichi Iga

Tokyo Institute of Technology

Takahiro Sakaguchi

Ritsumeikan University

Masanori Nakahama

Tokyo Institute of Technology

Xiaodong Gu

Tokyo Institute of Technology

Tomoyuki Miyamoto

Tokyo Institute of Technology

Mina Sato

Tokyo Institute of Technology

Hideo Ohtsuki

Sumco Corporation (Japan)

Kunio NISHIOKA

Tokuyama (Japan)

Hayato Sano

Mitsubishi Electric (Japan)

Cooperative Institutions

Tokyo Institute of Technology

189

The University of Tokyo

Tohoku University

Nagoya University

Osaka University

Kyoto University

Foundation for Ichthyosis and Related Skin Types

Yokohama National University

Tokyo University of Science

Japan Science and Technology Agency

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Slow Light VCSEL Amplifier for High-resolution Beam Steering and High-power Operations

Conference on Lasers and Electro-Optics (2016)

Masanori Nakahama Xijia Gu Akihiro Matsutani Takahiro Sakaguchi Fumio Koyama

We demonstrate the high-resolution beam-steering and amplification of novel VCSEL amplifiers, exhibiting beam steering of over 25° and sharp beam divergence of 0.1°. The output power reaches at 29mW with a chip gain of 18dB.

Vertical-cavity surface-emitting laser

Beam steering

10.1364/cleo_si.2016.sf1l.5

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Citations (8)

Giant wavelength-temperature dependence of 850nm VCSELs with a metal/semiconductor thermally actuated mirror

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (2013)

Masanori Nakahama Hayato Sano S. Inoue Akihiro Matsutani Takahiro Sakaguchi

We demonstrate a giant wavelength-temperature dependence of wavelength of a micromachined 850nm VCSEL with a thermally actuated metal/semiconductor cantilever mirror. The modeling shows a possibility of giant temperature dependence of wavelength of several nm/K, which is determined by cantilever length and metal thickness. The fabricated 850nm VCSEL exhibits a temperature dependence of -1.6 nm/K, and a wavelength tuning of 35 nm in 850 nm band was obtained by changing the device temperature by 12K. In addition, electro-thermal tuning was demonstrated using integrated micro heater. Continuous wavelength shift of 15 nm was obtained with heating power of 40 mW.

Vertical-cavity surface-emitting laser

10.1117/12.2003698

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Comparison between Modern Violin Bridge and Baroque Violin Bridge by Photoelastic Observation and Frequency Analysis

Japanese Journal of Applied Physics (2004)

Akihiro Matsutani

A comparison between the modern bridge and the baroque bridge of the violin by photoelastic observation was carried out. The relationship between the stress part and the hole is symmetric in the modern and baroque bridges. The measured spectral envelopes of baroque bridges are similar to those of modern bridges in D- or G-strings, and have peaks at a frequency higher than those of modern bridges in E-string. The visualization method as used in this study may provide hints for the design of violin bridges.

Baroque

Bridge (graph theory)

10.1143/jjap.43.2754

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Citations (7)

面発光レーザと集積したブラッグ反射鏡導波路増幅器の高シングルモード出力動作 ; High Single-mode Output Power in VCSEL-Integrated Bragg Ref lector Waveguide Amplifier

Xiaodong Gu 顧. 暁冬 Zeuku Ho 許. 在旭 Masanori Nakahama

Vertical-cavity surface-emitting laser

Waveguide

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Giant electro-thermal phase-shift in low-polarization dependent slow light bragg reflector waveguide

IEEE Photonics Conference (2012)

Ayumi Fuchida Akihiro Matsutani Fumio Koyama

We demonstrate a giant phase-shift in a slow-light Bragg reflector waveguide. A low polarization dependence of group index is clearly shown. We observed a large phase shift over 4p in 20μm-long waveguide thanks to slowing light.

Waveguide

Slow Light

10.1109/ipcon.2012.6359292

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Angled etching of (001) rutile Nb–TiO₂substrate using SF₆-based capacitively coupled plasma reactive ion etching

Japanese Journal of Applied Physics (2014)

Akihiro Matsutani Kunio NISHIOKA Mina Sato Dai Shoji D. Kobayashi

We demonstrated the plasma etching of a (001) rutile Nb–TiO2 substrate using SF6 plasma. A vertical etching profile and a smooth etched surface were obtained. In addition, the angled etching of a (001) rutile Nb–TiO2 substrate was achieved in a conventional SF6 reactive ion etching system for the first time. The etching angle was determined by the angle of the groove of the holder. We believe that our simple dry etching technique is suitable for the formation of a three-dimensional photonic crystal with complete photonic bandgap (CPBG) and optical waveguides.

Rutile

Dry etching

Groove (engineering)

Plasma Etching

10.7567/jjap.53.06jf02

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Citations (6)

Focusing Properties of Concave Micromirror Fabricated by SUMP Method and Laser Lithography

The Japan Society of Applied Physics (2019)

Akihiro Matsutani Ayako Takada

Sump (aquarium)

Maskless lithography

Digital micromirror device

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Multiple-wavelength GaInAs/GaAs vertical cavity surface emitting laser array with record wide wavelength span

M. Arai Takashi Kondo Akihiro Matsutani Tomoyuki Miyamoto Fumio Koyama

In this paper, we propose a growth pressure control during MOCVD growth of VCSEL wafers on a patterned substrate to avoid the mismatch between a grain peak and resonant mode. We demonstrate a multiple wavelength GaInAs/GaAs VCSEL array emitting in a new wavelength window of 0.9-1.2 /spl mu/m, exhibiting a record wavelength span of 192 nm.

Vertical-cavity surface-emitting laser

10.1109/drc.2003.1226912

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Measurement of Plasma Density for Control of Etching Profile in Inductively Coupled Plasma Etching of InP

Japanese Journal of Applied Physics (2002)

Akihiro Matsutani Hideo Ohtsuki Fumio Koyama Kenichi Iga

We investigated the effect of the plasma density on the control of the etching profile in an inductively coupled plasma (ICP) etching of InP. It was found that the total ion density is not a good measure of the control of the etching profile. We have to take into account the quantity of each ion for etching profile control. We suggest that the etching profile of InP can be controlled by the in situ monitoring of the quantity of Cl+ ions.

Plasma Etching

Dry etching

10.1143/jjap.41.3147

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Citations (6)

Tuning Characteristics of Monolithic MEMS VCSELs With Oxide Anti-Reflection Layer

IEEE Photonics Technology Letters (2013)

Masanori Nakahama Hayato Sano Shunya Inoue Takahiro Sakaguchi Akihiro Matsutani

We demonstrate a micromachined tunable vertical-cavity surface-emitting laser with a monolithically formed anti-reflection (AR) layer for highly efficient electro-thermal wavelength tuning. The AR layer is formed by the lateral oxidation of an aluminum-rich AlGaAs layer and no extra process is needed. We fabricated a micromachined GaAs vertical-cavity surface-emitting laser and measured its wavelength tuning characteristic. The measurement result shows that the oxide layer functions as an AR layer for linear and efficient tuning characteristics. A large negative temperature dependence of wavelength from -0.24 to -2.0 nm/K was demonstrated using a thermally actuated cantilever for efficient electro-thermal wavelength tuning. An electro-thermal tuning efficiency of -2.3 to -4.8 nm/mW was obtained.

Reflection

Vertical-cavity surface-emitting laser

10.1109/lpt.2013.2272732

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Citations (11)