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H.-J. Na

Samsung

2

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24

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First demonstration of low temperature $(\leq 500^{\circ}\mathrm{C})$ CMOS devices featuring functional RO and SRAM bitcells toward 3D VLSI integration

2020 VLSIT | Symposium on VLSI Technology
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Aggressively scaled high-k last metal gate stack with low variability for 20nm logic high performance and low power applications

2011 VLSIT | Symposium on VLSI Technology
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