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K. Nishitani
K. Nishitani
Tohoku University
Thin film
Crystallization
Crystallography
Annealing (metallurgy)
Molecular dynamics
2
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2024
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Development of Experiment Integrated Computational Chemistry and Its Application to Advanced Materials
2009
The Japan Society of Applied Physics
Akira Endou
K. Nishitani
Itaru Yamashita
Tasuku Onodera
M. Ise
Yukiko Obara
Akira Suzuki
Hideyuki Tsuboi
Nozomu Hatakeyama
H. Takaba
Momoji Kubo
Akira Miyamoto
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Prediction of Crystallization Temperature for HfO 2 Thin Film in High Temperature Annealing Process by Reaction Time Accelerating Molecular Dynamics
2009
The Japan Society of Applied Physics
K. Nishitani
H. Yabuhara
Akira Endou
Atsushi Suzuki
Hideyuki Tsuboi
Nozomu Hatakeyama
H. Takaba
Momoji Kubo
Akira Miyamoto
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