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Richard L. Lozes
Richard L. Lozes
Applied Materials
Optics
Electron-beam lithography
Physics
Proximity effect (audio)
Electronic engineering
7
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15
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Système et procédé de stratégie d’écriture d’exposition de faisceau
2006
Benyamin Buller
Richard L. Lozes
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Colonne de faisceau d'electrons pour l'inscription de faisceaux d'electrons formes
2006
Helmut Banzhof
Benyamin Buller
Steven T. Coyle
Vore William J De
Juergen Frosien
Xinrong Jiang
Richard L. Lozes
Henry Thomas Pearce-Percy
Dieter Winkler
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Contrast limitations in electron-beam lithography
1999
Journal of Vacuum Science & Technology B
Richard E. Crandall
Uli Hofmann
Richard L. Lozes
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Phase-shift mask technology: requirements for e-beam mask lithography
1991
Steven K. Dunbrack
Andrew Muray
Charles A. Sauer
Richard L. Lozes
John L. Nistler
William H. Arnold
David F. Kyser
Anna Maria Minvielle
Moshe E. Preil
Bhanwar Singh
Michael K. Templeton
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Proximity effect correction at 10 keV using ghost and sizing for 0.4 μm mask lithography
1990
Journal of Vacuum Science & Technology B
Andrew Muray
Richard L. Lozes
Kathy Milner
G. Hughes
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Citations (2)
1