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Eun-Kyung Son

10

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38

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Parameter investigation of PEB sensitivity

2006
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Diffusion contributions to line end shortening in 193-nm photolithography

2005
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Investigation of the effect of resist components and process condition on photochemical efficiency of ArF photoresist

2004
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Investigation on the role of residual casting solvent in photolithographic behavior in 193-nm resists

2003
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System for mediating payment of congratulation and condolence expenses

2000
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