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S-A. Chew
S-A. Chew
Katholieke Universiteit Leuven
Electronic engineering
Materials science
Contact resistance
Metal
NMOS logic
3
Papers
18
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0
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Process Variation Analysis of Device Performance Using Virtual Fabrication: Methodology Demonstrated on a CMOS 14-nm FinFET Vehicle
2020
IEEE Transactions on Electron Devices
Benjamin Vincent
Raghu Hathwar
Mattan Kamon
Joseph Ervin
Tom Schram
Thomas Chiarella
Steven Demuynck
Sylvain Baudot
Yong Kong Siew
Stenfan Kubicek
Eugenio Dentoni Litta
S-A. Chew
Jerome Mitard
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Citations (2)
Ultralow resistive wrap around contact to scaled FinFET devices by using ALD-Ti contact metal
2017
IITC | International Interconnect Technology Conference
S-A. Chew
H. Yu
Marc Schaekers
Steven Demuynck
G. Mannaert
Eddy Kunnen
Erik Rosseel
Andriy Hikavyy
A. Dangol
K. De Meyer
D. Mocuta
Naoto Horiguchi
Gert Leusink
Cory Wajda
Takahiro Hakamata
Toshio Hasegawa
K. Tapily
R S Clark
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Citations (16)
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