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David B Graves
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Thin film
Steady state
Molecular dynamics
Plasma etching
Finite element method
Surface science
Ion beam
Plasma processing
Atmospheric pressure
Inductively coupled plasma
Electric field
Electron ionization
Cross section
Electron cyclotron resonance
Low-pressure area
Radio frequency
Fluid queue
Plasma
Nitrogen
Mass spectrometry
Electron density
Electron temperature
Kinetics
Surface roughness
Computer simulation
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Thin film
Steady state
Molecular dynamics
Plasma etching
Finite element method
Surface science
Ion beam
Plasma processing
Atmospheric pressure
Inductively coupled plasma
Electric field
Electron ionization
Cross section
Electron cyclotron resonance
Low-pressure area
Radio frequency
Fluid queue
Plasma
Nitrogen
Mass spectrometry
Electron density
Electron temperature
Kinetics
Surface roughness
Computer simulation
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David B Graves
University Of Alabama At Birmingham
300
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